Patents by Inventor Michael Patrick Schlax

Michael Patrick Schlax has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Micromirror having counterbalancing structures and method for manufacturing same
    Patent number: 6846087
    Abstract: A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.
    Type: Grant
    Filed: July 30, 2002
    Date of Patent: January 25, 2005
    Assignees: Lucent Technologies Inc., Agere Systems Inc.
    Inventors: Dustin W Carr, Christopher John Frye, Timofei Nikita Kroupenkine, Victor Alexander Lifton, Michael Patrick Schlax, Alex T Tran, Joseph J Vuillemin
  • Micromirror having counterbalancing structures and method for manufacturing same
    Publication number: 20040021963
    Abstract: A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.
    Type: Application
    Filed: July 30, 2002
    Publication date: February 5, 2004
    Inventors: Dustin W. Carr, Christopher John Frye, Timofei Nikita Kroupenkine, Victor Alexander Lifton, Michael Patrick Schlax, Alex T. Tran, Joseph J. Vuillemin