Patents by Inventor Michael Patrick Walsh

Michael Patrick Walsh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10522326
    Abstract: A method of locating a substrate within a field of view of an imaging system includes acquiring an image of a first marker on a substrate in the field of view. The first marker has a first spatial pattern representing a position of the first marker relative to the substrate. The method also includes determining possible positions of the substrate based on the first spatial pattern and moving the substrate relative to the field of view based on the possible positions of the substrate. The method also includes acquiring an image of a second marker on the substrate in the field of view. The second marker has a second pattern representing a position of the second marker relative to the substrate. The method further includes determining the position of the substrate relative to the field of view based on the position of the second marker on the substrate.
    Type: Grant
    Filed: February 14, 2018
    Date of Patent: December 31, 2019
    Assignee: Massachusetts Institute of Technology
    Inventors: Michael Patrick Walsh, Dirk Robert Englund
  • Publication number: 20180233323
    Abstract: A method of locating a substrate within a field of view of an imaging system includes acquiring an image of a first marker on a substrate in the field of view. The first marker has a first spatial pattern representing a position of the first marker relative to the substrate. The method also includes determining possible positions of the substrate based on the first spatial pattern and moving the substrate relative to the field of view based on the possible positions of the substrate. The method also includes acquiring an image of a second marker on the substrate in the field of view. The second marker has a second pattern representing a position of the second marker relative to the substrate. The method further includes determining the position of the substrate relative to the field of view based on the position of the second marker on the substrate.
    Type: Application
    Filed: February 14, 2018
    Publication date: August 16, 2018
    Inventors: Michael Patrick Walsh, Dirk Robert Englund
  • Patent number: 6052844
    Abstract: A whirlpool bath assembly with a recirculation pump fed from the bath by a suction pipe and then to venturi jet units through by system feed pipes. Further air pipes feed the venturi jet units. A drain-off valve connects the pump through a drain pipe to a waste-water drain. All the units forming the assembly are constructed so as to provide a gravity drain-off into the bath and drain pipe. This is done by ensuring that height of the surfaces over which drain-off water flows when the assembly is inoperative reduce continuously without forming any water retaining recesses.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: April 25, 2000
    Assignee: Faiso Limited
    Inventors: Michael Patrick Walsh, Michael Hennessy