Abstract: Methods for analyzing temperature characteristics of an integrated circuit. In one embodiment, a beam of laser light is directed at the back side of an integrated circuit. The intensity level of laser light reflected from the integrated circuit is measured and compared to a reference intensity level. The magnitude of the difference between the reference intensity level and the intensity level of the reflected laser light is indicative of a temperature characteristic of the integrated circuit.

Abstract: Access to portions of semiconductor devices is enhanced via a method and system for probing between circuitry in the semiconductor device during post-manufacture analysis of the semiconductor device. According to an example embodiment of the present invention, an elongated conductive via probe is formed in a semiconductor device having circuitry in a circuit side opposite a back side. The probe is formed by first removing substrate from the semiconductor device and forming an exposed region over a target node between circuitry in the device. A narrow conductor is then formed for accessing the target node, with the conductor and extending between the circuitry and into the back side and forming the elongated conductive via probe. The probe is accessed and used for analyzing the device. In this manner, access to a difficult-to-reach target node, such as a node between closely-placed transistors, is facilitated.

Abstract: According to an example embodiment, an electronic circuit formed upon a front side surface of a semiconductor substrate having opposed front side and back side surfaces is analyzed. The back side surface of the semiconductor substrate is disposed in an optical path of a laser source. A coherency reducer is disposed in the optical path between the laser source and the back side surface. Using the laser source, a beam of laser light is directed toward the back side surface, and an electrical response from the electronic circuit is detected therefrom. The use of the coherency reducer improves the ability to detect the response.

Abstract: The ability to excite virtually any portion of semiconductor device is enhanced via a grid formed for exciting circuitry in the semiconductor device. According to an example embodiment of the present invention, a grid having a plurality of narrow probe points is formed extending over target circuitry in a semiconductor device. The grid is accessed and used for exciting various target circuitry within the device by exciting the part of the grid that corresponds to the portion of the target circuitry to which access is desired.

Abstract: According to one example embodiment, a latch-up condition in a semiconductor device is detected using a method involving use of a laser beam to scan through the backside of the semiconductor device and to ascertain an intensity threshold that is known to cause latch-up conditions. The intensity of the beam is altered and applied to designated regions within the semiconductor device to create latch-up at certain regions but not other regions. A latch-up condition present at a designated region is then detected using conventional microscopy equipment.

Abstract: Substrate removal for post-manufacturing analysis of a semiconductor device is enhanced via a method and system that use sonic energy in the control of the removal process. According to an example embodiment of the present invention, sonic energy is reflected off of a region of a semiconductor chip having a portion of substrate removed from the back side of the chip. The reflections are detected and used to determine the thickness of substrate in the back side. In this manner, the substrate removal process can be efficiently and accurately controlled.

Abstract: A resistance monitoring approach is used for removing substrate from a back side of a semiconductor device. According to an example embodiment of the present invention, substrate is removed from a semiconductor device having a circuit side opposite the back side and a resistance path in silicon substrate. The change in resistance of the resistance path is monitored. The change in resistance provides an indication of the progress of the substrate removal process. Using the change in resistance, the substrate removal process is controlled.

Abstract: The present invention is directed to a method for post-manufacturing analysis of a semiconductor device including a die in a semiconductor device package. According to an example embodiment of the present invention, the package is removed and the die is exposed. Conductive ions are impregnated in a region of the die and a diode is formed. Using the formed diode, target circuitry within the die is analyzed. In this manner, a diode can be formed and used for purposes such as testing or repairing a die.

Abstract: Substrate removal for post-manufacturing analysis of a semiconductor device is enhanced via a method and system that utilizes ion beam etching, to etch the backside of a semiconductor chip, and utilizes SIMS as a detection technique to not only control removal of the substrate from the backside of the chip but also to determine the endpoint of the removal process. In an example embodiment there is described a method for removing substrate from the backside of a semiconductor chip as a function of detected concentration levels of a selected substrate material that is sputtered off of a region of the substrate.

Abstract: Post-manufacturing analysis of a semiconductor device is enhanced via a method and system that use a light emitting diode (LED) formed in a semiconductor die during its manufacture. According to an example embodiment of the present invention, a LED is formed within a semiconductor die having a circuit side opposite a back side. A conductor is formed that extends from the LED to the back side of the die, and is coupled to a terminal formed on the back side. The LED is activated via the terminal and used to align the die for analysis. By forming a LED within the semiconductor die during its manufacture, post manufacturing analysis is enhanced by the alignment capabilities provided by the readily activated LED.

Abstract: According to one aspect of the disclosure, the present invention provides methods and arrangements for testing a flip chip semiconductor device after the back side of the chip has been thinned to expose a selected region in the substrate. For some chips, thinning removes substrate material useful for drawing heat away from the internal circuitry when the circuitry is running at high speeds. To compensate for this material loss, as plurality of thermally conductive elements is formed in the backside of the semiconductor to draw heat from the backside of the device when the semiconductor device is activated.

Abstract: A substrate removal approach involves sensing acoustic energy in a semiconductor device as a function of substrate thickness in the device as substrate is being removed. According to an example embodiment of the present invention, a semiconductor chip having substrate at a back side that is opposite circuitry at a circuit side is analyzed. Some or all of the substrate in the back side of the semiconductor chip is removed, and a thinned region having a bottom area is formed. A laser is directed to the bottom area, and a thermal parameter characterizing target circuitry in the device is detected in response to the laser. The detected parameter is used and an indication of the remaining substrate thickness between the bottom area and the circuitry is determined. In response to the indicated thickness, the substrate removal process is controlled, making possible effective control of the substrate removal process.

Abstract: A substrate removal approach involves sensing acoustic energy in an integrated circuit as a function of substrate in the integrated circuit being removed. According to an example embodiment of the present invention, a method for substrate removal includes removing a portion of substrate from the back side of a semiconductor chip circuitry near a circuit side and opposite the back side. The substrate is removed as a function of detected acoustic energy propagating through the device. The detected acoustic energy can be correlated to a parameter and used for controlling the substrate removal process, improving the ability to efficiently and accurately test semiconductor devices.

Abstract: Post-manufacturing analysis of a semiconductor device is enhanced via a method that uses a light emitting diode (LED) formed in a semiconductor die. According to an example embodiment of the present invention, a LED is formed within a semiconductor die having a circuit side opposite a back side. The LED is activated and generates radiation. Substrate is removed from the device, and the amount of radiation that passes through the substrate is detected. The amount of radiation that passes through the die is a function of the absorption characteristics of the die and the substrate thickness. By detecting the radiation and using the absorption characteristics of the die, the amount of substrate remaining in the back side of the die is determined and the substrate removal process is controlled therefrom.

Abstract: Methods for analyzing temperature characteristics of an integrated circuit. In one embodiment, a beam of laser light is directed at the back side of an integrated circuit. The intensity level of laser light reflected from the integrated circuit is measured and compared to a reference intensity level. The magnitude of the difference between the reference intensity level and the intensity level of the reflected laser light is indicative of a temperature characteristic of the integrated circuit.