Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Abstract: To provide protection for power supplies in which a plurality of paralleled identical DC power cables are provided between a source and a load, one aspect of the present invention provides a method for detecting conditions in parallel DC power cables. The method includes supplying current from a power supply to each of a plurality of DC power cables, determining an average current per cable flowing in the plurality of parallel DC power cables, comparing currents in each of the DC power cables with the determined average current, and signaling the existence of a condition in response to the comparison.

Abstract: To provide protection for power supplies in which a plurality of paralleled identical DC power cables are provided between a source and a load, one aspect of the present invention provides a method for detecting conditions in parallel DC power cables. The method includes supplying current from a power supply to each of a plurality of DC power cables, determining an average current per cable flowing in the plurality of parallel DC power cables, comparing currents in each of the DC power cables with the determined average current, and signaling the existence of a condition in response to the comparison.