Abstract: Blind devices and related methods for lithography systems are described. An exemplary system has a vacuum chamber with first and second chamber portions. In a member between the chambers is defined an exposure aperture, relative to which a reticle stage in the first chamber portion moves a reticle. A gas enters the first chamber portion and establishes a thermophoretic condition relative to the reticle or portion thereof. A fixed-blind-aperture assembly, movable relative to the exposure aperture and the reticle to exposure and non-exposure positions, defines an illumination aperture through which light from the second chamber portion and gas from the first chamber portion pass when the fixed-blind-aperture assembly is in the exposure position. A gas-passage aperture in the member conducts the gas, passing through the illumination aperture, from the first chamber portion to the second chamber portion when the fixed-blind-aperture assembly is in the non-exposure position.

Abstract: Thermal-transfer devices (e.g., cooling devices) are disclosed for optical elements. An exemplary device includes a thermally conductive substrate having a surface. At least one mounting element extends from the surface to a reverse face of the optical element. The mounting element positions the optical element relative to the substrate with a gap between the surface and the reverse face. At least one gas-introduction port is situated relative to the gap. Also included is a gaseous thermal-conduction pathway across the gap between the optical element and the substrate. The thermal-conduction pathway includes flowing gas introduced (e.g., as a thin layer) into the gap by the gas-introduction port.

Abstract: Systems are disclosed for providing a controlled atmosphere. In an exemplary system an atmosphere-release device delivers a flow of the atmosphere to a propagation pathway. A density-fluctuation monitor includes multiple interferometer beams propagating in a direction in the pathway. The number of beams is sufficient for determining position of a member along the direction and for producing a mutual signal fluctuation that is a function of atmosphere-density fluctuations in the beams in the pathway. A controller coupled to the density-fluctuation monitor receives respective signals from the interferometers, determines the mutual signal fluctuation from the interferometer signals, and produces respective control commands from the mutual signal fluctuation.

Abstract: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

Abstract: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

Abstract: Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

Abstract: Sensors and monitors are disclosed for monitoring density fluctuations in an atmosphere, particularly an atmosphere through which interferometer beam(s) are propagating. An exemplary sensor includes multiple interferometers that produce respective beams propagating in a direction through the atmosphere. The interferometers are of a quantity that is at least one more than necessary for determining position of an object in the direction. A processor is connected to the interferometers so as to receive respective signals from the interferometers. The processor determines, from the interferometer signals, a mutual signal fluctuation that is a function of atmosphere-density fluctuations encountered by the propagating beams in their respective beam paths and sensed by the interferometers.

Abstract: Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is situated relative to and spaced from the surface, and is configured to produce a thermophoretic force, in a gas flowing past and contacting the surface, sufficient to inhibit particles in the gas from contacting the surface. The electrophoresis device is situated relative to a region of the surface contacted by the gas and is configured to deflect particles, having an electrostatic charge, in the gas away from the region as the gas flows past the region.

Abstract: Apparatus and methods are disclosed for reducing particle contamination of a surface of an object such as a reticle used in an EUV lithography system. An exemplary apparatus includes a thermophoresis device and an electrophoresis device. The thermophoresis device is situated relative to and spaced from the surface, and is configured to produce a thermophoretic force, in a gas flowing past and contacting the surface, sufficient to inhibit particles in the gas from contacting the surface. The electrophoresis device is situated relative to a region of the surface contacted by the gas and is configured to deflect particles, having an electrostatic charge, in the gas away from the region as the gas flows past the region.

Abstract: Optical windows are provided that transmit light such as deep-UV (DUV) light. An exemplary window includes a window substrate that is transmissive to at least one wavelength of the light. The window substrate has an incidence surface decorated with sub-wavelength asperities arranged so as to render the incidence surface solvophobic to the light-transmissive liquid. The arrangement of sub-wavelength asperities can be configured to render the incidence surface super-solvophobic to the liquid. The sub-wavelength asperities can have any of various shapes and combinations thereof, and can be regularly or irregularly arranged.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device stage (14), a stage mover assembly (16), and a follower assembly (18). The stage mover assembly (16) moves the device stage (14) along an X axis, along a Y axis and about a Z axis. The follower assembly (18) includes a first follower guide (76) and a first follower frame (80). The first follower guide (76) supports the first follower frame (80) and allows the first follower frame (80) to move along the Y axis. Further, the first follower frame (80) supports the device stage (14) and allows the device stage (14) to move along the Y axis, along the X axis, and about the Z axis. Importantly, the first follower frame (80) is moved along the Y axis with a first follower mover (84). With this design, the device stage (14) can be made relatively thin vertically and the control lines (20) to the device stage (14) can be relatively short.

Abstract: A linear electric motor (10) including a magnet component (12), a conductor component (14) that interacts with the magnet component (12) and a control system (15) for directing current to the conductor component (14) is provided herein. Uniquely, the conductor component (14) minimizes the total stray magnetic fields generated by the conductor component (14), without significantly influencing the dynamic performance of the motor (10). Because of the conductor component (14) provided herein, the motor (10) is particularly useful in manufacturing, measurement and/or inspection processes that are sensitive and/or influenced by stray AC magnetic fields. More specifically, the present invention is particularly useful with an exposure apparatus (18) that utilizes an illumination system (24) that generates a charged particle beam, such as an electron beam.

Abstract: A magnetic shunt assembly (12) for an exposure apparatus (10) includes a magnetic shunt assembly (12). The apparatus (10) includes an optical assembly (24)(26), a stage (44), a first mover assembly (16) that moves the stage (44) in a first gap (37). The first mover assembly (16) is surrounded by a magnetic field. The magnetic shunt assembly (12) is positioned near the optical assembly (24)(26) approximately between the optical assembly (24)(26) and the mover assembly (16). The magnetic shunt assembly (12) is made of a material having a relatively high magnetic permeability. The magnetic shunt assembly (12) can provide a low magnetic reluctance path that redirects at least a portion of the magnetic field from the first mover assembly (16) away from the gap (37).

Abstract: A linear brushless electric motor (10) including a magnet component (12), a conductor component (14) that interacts with the magnet component (12) and a control system (15) for directing current to the conductor component (14) is provided herein. Uniquely, the conductor component (14) includes an auxiliary conductor array (42) that reduces stray magnetic fields generated by the electric motor (10), without significantly influencing the dynamic performance of the motor (10) and without significantly increasing the size of the motor (10). Because of the conductor component (14) provided herein, the motor (10) is particularly useful in manufacturing, measurement and/or inspection processes that are sensitive and/or influenced by stray AC magnetic fields. More specifically, the present invention is particularly useful with an exposure apparatus (18) that utilizes an illumination system (24) that generates a charged particle beam, such as an electron beam.

Abstract: A linear electric motor (10) including a magnet component (12), a conductor component (14) that interacts with the magnet component (12) and a control system (15) for directing current to the conductor component (14) is provided herein. Uniquely, the conductor component (14) minimizes the total stray magnetic fields generated by the conductor component (14), without significantly influencing the dynamic performance of the motor (10). Because of the conductor component (14) provided herein, the motor (10) is particularly useful in manufacturing, measurement and/or inspection processes that are sensitive and/or influenced by stray AC magnetic fields. More specifically, the present invention is particularly useful with an exposure apparatus (18) that utilizes an illumination system (24) that generates a charged particle beam, such as an electron beam.

Abstract: An element control system (32) that reduces the effects on image quality of thermal distortions in an optical element (28) of a lithography system (10) includes a heat source (50) that primarily heats a non-illuminated region (44) of the optical element (28) to alter and/or control the shape of the illuminated part of the optical element (28). The heat source (50) directs heat to the non-illuminated region (44) and/or an illuminated region (42) to simplify and/or alter the shape of thermal distortions aberrations in the optical element (28).

Abstract: An inspection system (100) for inspecting a mask (101) to determine if the mask (101) has at least one desired transparent area (902) organized in a desired transparent pattern (908) and at least one desired opaque area (900) organized in a desired opaque pattern (906). The mask (101) includes an actual mask pattern (103C) having at least one actual transparent area (103A) and at least one actual opaque area (103B). In one embodiment, the inspection system can include a beamlet supply assembly (111) that (i) directs a shaped beamlet towards one of the actual areas (103A, 103B) of the mask (101), and/or (ii) directs a plurality of beamlets simultaneously towards the mask (101).

Abstract: A magnetic shunt assembly (12) for an exposure apparatus (10) includes a magnetic shunt assembly (12). The apparatus (10) includes an optical assembly (24)(26), a stage (44), a first mover assembly (16) that moves the stage (44) in a first gap (37). The first mover assembly (16) is surrounded by a magnetic field. The magnetic shunt assembly (12) is positioned near the optical assembly (24)(26) approximately between the optical assembly (24)(26) and the mover assembly (16). The magnetic shunt assembly (12) is made of a material having a relatively high magnetic permeability. The magnetic shunt assembly (12) can provide a low magnetic reluctance path that redirects at least a portion of the magnetic field from the first mover assembly (16) away from the gap (37).

Abstract: A support assembly (12) for an exposure apparatus (10) includes a frame assembly (34), an elevator assembly (36) and a pivot assembly (38) for supporting at least one subassembly above an isolation base (32). The elevator assembly (36) selectively lifts the frame assembly (34) and the subassembly relative to the isolation base (32). Further, the pivot assembly (38) allows a portion of the frame assembly (34) and the subassembly to be rotated relative to the isolation base (32). As a result of this design, the subassemblies of the exposure apparatus (10) can be removed relatively easily for service and adjustment.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device stage (14), a stage mover assembly (16), and a follower assembly (18). The stage mover assembly (16) moves the device stage (14) along an X axis, along a Y axis and about a Z axis. The follower assembly (18) includes a first follower guide (76) and a first follower frame (80). The first follower guide (76) supports the first follower frame (80) and allows the first follower frame (80) to move along the Y axis. Further, the first follower frame (80) supports the device stage (14) and allows the device stage (14) to move along the Y axis, along the X axis, and about the Z axis. Importantly, the first follower frame (80) is moved along the Y axis with a first follower mover (84). With this design, the device stage (14) can be made relatively thin vertically and the control lines (20) to the device stage (14) can be relatively short.