Abstract: An inspection system utilized to inspect a structure for particularities, including defects, includes a first gantry with a detector inspection device that is placed in a known position on one side of the structure, and a second gantry with a source inspection device that is placed on the other side of the structure. In an embodiment, the detector inspection device is an x-ray detector inspection device and the source inspection device is an x-ray source inspection device. The movement of the first and second gantries is controlled by a gantry control system. A data acquisition system controls the data, e.g., image, collection process. During the data collection process, the relative positions of the source and detector inspection devices are initialized. The detector and source inspection devices are then moved in synchronized motion to each data collection position, such that the relative alignment of the inspection devices is maintained.

Abstract: An inspection system utilized to inspect a structure for particularities, including defects, includes a first gantry with a detector inspection device that is placed in a known position on one side of the structure, and a second gantry with a source inspection device that is placed on the other side of the structure. In an embodiment, the detector inspection device is an x-ray detector inspection device and the source inspection device is an x-ray source inspection device. The movement of the first and second gantries is controlled by a gantry control system. A data acquisition system controls the data, e.g., image, collection process. During the data collection process, the relative positions of the source and detector inspection devices are initialized. The detector and source inspection devices are then moved in synchronized motion to each data collection position, such that the relative alignment of the inspection devices is maintained.