Abstract: To measure an illumination angle distribution, which is established via a multiplicity of illumination channels of an illumination optics unit, on an object field via an obscured projection optics unit, a setpoint pupil lighting of an illumination pupil of the illumination optics unit is initially established. With the aid of the setpoint pupil lighting, whether splitting of a measurement pupil lighting into a reflection measurement pupil and a diffraction measurement pupil is desired is checked. Depending on the result of the check, a reflection measurement pupil lighting and/or a diffraction measurement pupil lighting of the illumination optics unit is established by establishing corresponding illumination channels. The reflection measurement pupil lighting is measured by inserting a reflective object into the object field and/or the diffraction measurement pupil lighting is measured by inserting a diffractive object into the object field. An actual pupil lighting is reconstructed from the measurement data.

Abstract: An optical system for a projection exposure apparatus has an illumination optical unit for guiding illumination and imaging light from a light source to an object field, in which an object to be imaged is arrangeable, and an imaging optical unit for imaging the object field into an image field, in which a substrate to be exposed is arrangeable. The imaging optical unit has an exit pupil having at least one obscuration exit pupil region located within an outer pupil edge. The illumination optical unit is embodied in such a way that an illumination angle distribution of an illumination of the object field using the illumination and imaging light arises and is describable by way of an illumination pupil, the illumination pupil region of which impinged upon by illumination light being adapted to the obscuration exit pupil region of the imaging optical unit. The obscuration exit pupil region of the imaging optical unit can have a non-centric geometric centroid.

Abstract: An illumination optical unit for projection lithography has a transfer facet mirror, an illumination specification facet mirror and a monitoring device. The latter has at least one spatially resolving monitoring sensor and a satellite facet, which belongs to the transfer facet mirror and is assigned to in each case exactly one monitoring transfer facet. The satellite facet is oriented in such a way that monitoring light from a monitoring light source is guided via the satellite facet and an illumination specification facet to be monitored, which is assigned to the monitoring transfer facet via an illumination channel, along a monitoring light channel to the monitoring sensor. The result is an illumination optical unit in which a tilting of illumination specification facets of an illumination specification facet mirror can be effectively monitored.

Abstract: An illumination optical unit has two facet mirrors for reflectively guiding illumination light from an EUV light source. The second facet mirror has second individual mirrors forming second facets which, via partial beams of the illumination light, image individual-mirror groups of the first facet mirror forming first facets at least into partial fields of an object field. An intensity sensor device serves for measuring a dependence of an intensity of the illumination light incident on the object field on at least one detection object field coordinate. The intensity sensor device has sensor individual mirrors of the first facet mirror which are assigned to a plurality of different object field positions along the detection object field coordinate. The sensor individual mirrors are designed for reflectively guiding the illumination light to intensity sensors of the intensity sensor device.

Abstract: To measure an illumination angle distribution, which is established via a multiplicity of illumination channels of an illumination optics unit, on an object field via an obscured projection optics unit, a setpoint pupil lighting of an illumination pupil of the illumination optics unit is initially established. With the aid of the setpoint pupil lighting, whether splitting of a measurement pupil lighting into a reflection measurement pupil and a diffraction measurement pupil is desired is checked. Depending on the result of the check, a reflection measurement pupil lighting and/or a diffraction measurement pupil lighting of the illumination optics unit is established by establishing corresponding illumination channels. The reflection measurement pupil lighting is measured by inserting a reflective object into the object field and/or the diffraction measurement pupil lighting is measured by inserting a diffractive object into the object field. An actual pupil lighting is reconstructed from the measurement data.