Patents by Inventor Michael Raum

Michael Raum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for a microlithgraphic exposure apparatus
    Patent number: 8873151
    Abstract: An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: October 28, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexander Sohmer, Aurelian Dodoc, Heiko Feldmann, Wilhelm Ulrich, Gerhard Fuerter, Rafael Egger, Artur Moegele, Michael Raum
  • Illumination System for a Microlithgraphic Exposure Apparatus
    Publication number: 20080192359
    Abstract: An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666?) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).
    Type: Application
    Filed: April 26, 2006
    Publication date: August 14, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Alexander Sohmer, Aurelian Dodoc, Heiko Feldmann, Wilhelm Ulrich, Gerhard Furter, Rafael Egger, Artur Hogele, Michael Raum