Patents by Inventor Michael Ringel

Michael Ringel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12711152
    Abstract: Systems and methods can be provided for processing information. Multiple categories of ties for multiple types of assets can be identified, where a tie can comprise a relationship between assets. A relative importance for each tie category can be determined. A category weight for each tie category can be assigned using a determined relative importance for each tie category. A tie value can be combined with a tie category weight to create a weighted tie value for each tie. All tie weighted values can be combined into a meta tie value.
    Type: Grant
    Filed: October 26, 2023
    Date of Patent: August 18, 2026
    Assignee: The Boston Consulting Group, Inc.
    Inventors: Wendi Backler, Nicole Quenneville, Harsh Kaushik, Ruchika Mendiratta, Michael Ringel, Joe Brillando, Alex Aboshiha, Chris Yellick, Carl Reed Jessen
  • Patent number: 8212992
    Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: July 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Peter Kloesch, Michael Ringel, Markus Weiss
  • Publication number: 20110205507
    Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.
    Type: Application
    Filed: March 11, 2011
    Publication date: August 25, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Peter Kloesch, Michael Ringel, Markus Weiss
  • Patent number: 4790699
    Abstract: A rotary coaxial air feed tube assembly for a pneumatic chuck with one end of the assembly screw coupled to the chuck and the other end of the assembly being coupled to a rotary air feed joint, keying means being provided for coupling the feed tube assembly to a rotary drive spindle so as to impart a rotary drive to the assembly and to the chuck.
    Type: Grant
    Filed: April 20, 1987
    Date of Patent: December 13, 1988
    Assignee: Amcor Ltd.
    Inventor: Michael Ringel