Patents by Inventor Michael S. Amann

Michael S. Amann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of providing a material processing ion beam
    Patent number: 6818257
    Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.
    Type: Grant
    Filed: September 17, 2002
    Date of Patent: November 16, 2004
    Assignee: Advanced Energy Industries, Inc.
    Inventors: Michael S. Amann, Michael Kishinevsky, Andrew Shabalin, Colin Quinn
  • System for deposition of diamond like carbon
    Publication number: 20030077402
    Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.
    Type: Application
    Filed: September 17, 2002
    Publication date: April 24, 2003
    Applicant: Advanced Energy Industries, Inc.
    Inventors: Michael S. Amann, Michael Kishinevsky, Andrew Shabalin, Colin Quinn
  • Method for deposition of diamond like carbon
    Patent number: 6451389
    Abstract: Systems to achieve both more uniform and particle free DLC deposition is disclosed which automatically cycles between modes to effect automatic removal of carbon-based buildups or which provides barriers to achieve proper gas flow involves differing circuitry and design parameter options. One ion source may be used in two different modes whether for DLC deposition or not through automatic control of gas flow types and rates and through the control of the power applied to achieve maximum throughput or other desired processing goals. Arcing can be controlled and even permitted to optimize the overall results achieved.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: September 17, 2002
    Assignee: Advanced Energy Industries, Inc.
    Inventors: Michael S. Amann, Michael Kishinevsky, Andrew Shabalin, Colin Quinn