Abstract: Embodiments of the invention include an apparatus for uniformly contaminating samples. The apparatus includes a housing that contains a rotatable carousel for the holding samples. A drive element is used for rotating the carousel. The apparatus includes a contaminant dispenser for dispersing a contaminant onto the samples. The apparatus also includes a control element that can be used to control contaminant dose and carousel rotation rate and rotation time. A method for uniformly contaminating samples includes providing such a contamination chamber and placing a plurality of samples within the chamber. A contaminant is introduced into the chamber and the samples are spun so that the contaminant is uniformly distributed onto the spinning samples. After contamination the samples are removed from the chamber.

Abstract: The present invention is directed to a uniform airflow diffuser for utilization in a process chamber, such as a process chamber utilized in the manufacture of semiconductor chips. The uniform airflow diffuser is suitable for generating a back flow of air sufficient to cause the airflow to be distributed across the airflow diffuser. The resultant build-up in pressure in the plenum area may result in uniform airflow through a plurality of holes included in the airflow diffuser yielding substantially laminar airflow through the chamber.

Abstract: A method for detecting contaminants on an implement. A stream of gas is directed over at least a portion of the implement, to entrain at least a portion of the contaminants on the implement, and produce a contaminant laden stream of gas. At least a portion of the contaminant laden stream of gas is sampled, and the amount of contaminants in the sampled portion of the contaminant laden stream of gas is measured. The amount of contaminants in the sampled portion of the contaminant laden stream of gas is reported.