Patents by Inventor Michael Saettler

Michael Saettler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240103035
    Abstract: A micromechanical component, in particular, an inertial sensor, including a seismic mass, a substrate, and a cap. The component includes a reference electrode, which is in a first electrode layer and is connected to the substrate, and a further reference electrode, which is in a second electrode layer and is connected to the cap. The seismic mass is deflectable on two sides, in a direction perpendicular to the major plane of extension of the reference electrode. The seismic mass includes a flexible limit stop in the direction of deflection towards the first electrode layer. The flexible limit stop is connected to the main part of the seismic mass using a spring element. The spring element is in an elastic layer, which is positioned between a layer of the main part of the seismic mass and the first electrode layer.
    Type: Application
    Filed: September 25, 2020
    Publication date: March 28, 2024
    Inventors: Johannes Classen, Michael Saettler
  • Patent number: 8692339
    Abstract: In a method for manufacturing a micromechanical component, a cavity is produced in the substrate from an opening at the rear of a monocrystalline semiconductor substrate. The etching process used for this purpose and the monocrystalline semiconductor substrate used are controlled in such a way that a largely rectangular cavity is formed.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: April 8, 2014
    Assignee: Robert Bosch GmbH
    Inventors: Jochen Reinmuth, Michael Saettler, Stefan Weiss, Arnim Hoechst
  • Publication number: 20110198713
    Abstract: In a method for manufacturing a micromechanical component, a cavity is produced in the substrate from an opening at the rear of a monocrystalline semiconductor substrate. The etching process used for this purpose and the monocrystalline semiconductor substrate used are controlled in such a way that a largely rectangular cavity is formed.
    Type: Application
    Filed: June 3, 2009
    Publication date: August 18, 2011
    Inventors: Jochen Reinmuth, Michael Saettler, Stefan Weiss, Arnim Hoechst
  • Patent number: 7795586
    Abstract: A device for detecting radiation signals and a device for measuring the concentration of a substance are described, a first detector and a second detector being provided on a first chip, and a first filter and a second filter being provided on a second chip, the first chip and the second chip being connected to one another in hermetically sealed fashion.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: September 14, 2010
    Assignee: Robert Bosch GmbH
    Inventors: Christian Krummel, Michael Arndt, Michael Saettler, Frank Fischer
  • Publication number: 20070057187
    Abstract: A device for detecting radiation signals and a device for measuring the concentration of a substance are described, a first detector and a second detector being provided on a first chip, and a first filter and a second filter being provided on a second chip, the first chip and the second chip being connected to one another in hermetically sealed fashion.
    Type: Application
    Filed: February 27, 2003
    Publication date: March 15, 2007
    Inventors: Christian Krummel, Michael Arndt, Michael Saettler, Frank Fischer