Abstract: Methods for installing a plant hydration status sensor into a plant to provide reliable plant hydration data are disclosed. One contemplated method comprises creating a hole from an exterior surface of the plant to a depth that exposes the water tissue. Once the hole is created, a slurry can be applied, and a sleeve and a plant hydration status sensor can be inserted into the hole. A sealant can be applied about the plant hydration status sensor and the sleeve to prevent or reduce sensor interference due to outside environment conditions.

Abstract: Various embodiments are directed towards including heritage information when allocating costs for a plurality of cost objects. A target object, a source object and heritage objects may be determined from a data model. At least one line item in the source object may be generated by allocating costs from the heritage objects with the generated source object line items corresponding to a line item from a heritage object. At least one line item in the target object may be generated based on allocating costs from the source object. And, at least one generated target object line item may be based on at least one source object line item and its corresponding heritage object line item. A final cost value for the target object may be generated based on a sum of each target object line item and displayed in the data model.

Abstract: A device for measuring a chemical potential of a fluid in a plant tissue includes a cavity disposed within a sensor body as a liquid reservoir. The cavity is configured for containing therein a liquid, and the cavity including at least one opening. At least two porous membrane layers are positioned at least in part over the at least one opening of the cavity for selectively allowing water transfer between the plant fluid and the liquid in the cavity. At least one pressure sensor is configured for detecting changes in pressure of the liquid in the cavity. The changes are related to a chemical potential of the fluid in the plant tissue.

Abstract: A multimodal sensor includes a microtensiometer for measuring the chemical potential of a sub-saturated liquid, a temperature sensor, and a water content sensor. The microtensiometer includes a sensor body comprising a first gas-impermeable layer, an opposing second gas-impermeable layer, and a porous membrane layer disposed therebetween. The sensor body defines an internal liquid reservoir. The membrane layer is fluidly connected with the liquid reservoir, and extends to an outside edge of the microtensiometer. The membrane layer defines a plurality of through pores providing an open path from the liquid reservoir to the outside edge of the microtensiometer. The pores have a maximum diameter of 3 millimeters. The microtensiometer further includes a sensor adapted to measure changes in pressure between the liquid reservoir and an outside environment. The temperature sensor is integrated onto the microtensiometer body, and the water content sensor is coupled to the microtensiometer body.

Abstract: A multimodal sensor includes a microtensiometer for measuring the chemical potential of a sub-saturated liquid, a temperature sensor, and a water content sensor. The microtensiometer includes a sensor body comprising a first gas-impermeable layer, an opposing second gas-impermeable layer, and a porous membrane layer disposed therebetween. The sensor body defines an internal liquid reservoir. The membrane layer is fluidly connected with the liquid reservoir, and extends to an outside edge of the microtensiometer. The membrane layer defines a plurality of through pores providing an open path from the liquid reservoir to the outside edge of the microtensiometer. The pores have a maximum diameter of 3 millimeters. The microtensiometer further includes a sensor adapted to measure changes in pressure between the liquid reservoir and an outside environment. The temperature sensor is integrated onto the microtensiometer body, and the water content sensor is coupled to the microtensiometer body.

Abstract: Various embodiments are directed towards including heritage information when allocating costs for a plurality of cost objects. A target object, a source object and heritage objects may be determined from a data model. At least one line item in the source object may be generated by allocating costs from the heritage objects with the generated source object line items corresponding to a line item from a heritage object. At least one line item in the target object may be generated based on allocating costs from the source object. And, at least one generated target object line item may be based on at least one source object line item and its corresponding heritage object line item. A final cost value for the target object may be generated based on a sum of each target object line item and displayed in the data model.

Abstract: An asset locator device including (a) a wireless receiver capable of receiving an identifier signal transmitted from a short range wireless transmitter device; (b) a wireless transmitter capable of transmitting a message to a space based network; (c) a positioning system capable of determining the location of the locator device; (d) a vibration sensor; and (e) a controller. The controller instructs the asset locator to: (i) attempt to detect the identifier signal from the transmitter device if the vibration sensor senses vibration; and (ii) transmit a signal, including an asset location, to the space based network if: (1) the identifier signal is not detected; and (2) location fixes from the positioning system indicate a location change of the asset.

Abstract: Disclosed are systems, apparatus and methods for tracking or locating an asset along with providing emergency and non-emergency messaging services. An asset tracker is disposed on an asset. The asset tracker has a motion sensor, a GPS receiver and a simplex satellite transmitter for communicating with a remote location (back office processing center). The asset tracker also has a short-range transceiver for communicating with a fob device carried by a user. If an authorized fob device is not in range of the asset tracker device and the asset tracker device moves, as determined by the motion sensor and/or GPS location data, GPS data are transmitted via a satellite to the back office. The office sends the information to a desired recipient (asset owner, law enforcement, etc.). The fob device communicates with the asset tracker device when it is in proximity thereof.

Abstract: Disclosed are systems, apparatus and methods for tracking or locating an asset along with providing emergency and non-emergency messaging services. An asset tracker is disposed on an asset. The asset tracker has a motion sensor, a GPS receiver and a simplex satellite transmitter for communicating with a remote location (back office processing center). The asset tracker also has a short-range transceiver for communicating with a fob device carried by a user. If an authorized fob device is not in range of the asset tracker device and the asset tracker device moves, as determined by the motion sensor and/or GPS location data, GPS data are transmitted via a satellite to the back office. The office sends the information to a desired recipient (asset owner, law enforcement, etc.). The fob device communicates with the asset tracker device when it is in proximity thereof.

Abstract: An asset locator device including (a) a wireless receiver capable of receiving an identifier signal transmitted from a short range wireless transmitter device; (b) a wireless transmitter capable of transmitting a message to a space based network; (c) a positioning system capable of determining the location of the locator device; (d) a vibration sensor; and (e) a controller. The controller instructs the asset locator to: (i) attempt to detect the identifier signal from the transmitter device if the vibration sensor senses vibration; and (ii) transmit a signal, including an asset location, to the space based network if: (1) the identifier signal is not detected; and (2) location fixes from the positioning system indicate a location change of the asset.

Abstract: A continuous in situ process of deposition, etching, and deposition is provided for forming a film on a substrate using a plasma process. The etch-back may be performed without separate plasma activation of the etchant gas. The sequence of deposition, etching, and deposition permits features with high aspect ratios to be filled, while the continuity of the process results in improved uniformity.

Abstract: A continuous in situ process of deposition, etching, and deposition is provided for forming a film on a substrate using a plasma process. The etch-back may be performed without separate plasma activation of the etchant gas. The sequence of deposition, etching, and deposition permits features with high aspect ratios to be filled, while the continuity of the process results in improved uniformity.

Abstract: A method of cleaning a semiconductor fabrication processing chamber involves recirculation of cleaning gas components. Consequently, input cleaning gas is utilized efficiently, and undesirable emissions are reduced. The method includes flowing a cleaning gas to an inlet of a processing chamber, and exposing surfaces of the processing chamber to the cleaning gas to clean the surfaces, thereby producing a reaction product. The method further includes removing an outlet gas including the reaction product from an outlet of the processing chamber, separating at least a portion of the reaction product from the outlet gas, and recirculating a portion of the outlet gas to the inlet of the processing chamber.

Abstract: A continuous in situ process of deposition, etching, and deposition is provided for forming a film on a substrate using a plasma process. The etch-back may be performed without separate plasma activation of the etchant gas. The sequence of deposition, etching, and deposition permits features with high aspect ratios to be filled, while the continuity of the process results in improved uniformity.

Abstract: A method of cleaning a semiconductor fabrication processing chamber involves recirculation of cleaning gas components. Consequently, input cleaning gas is utilized efficiently, and undesirable emissions are reduced. The method includes flowing a cleaning gas to an inlet of a processing chamber, and exposing surfaces of the processing chamber to the cleaning gas to clean the surfaces, thereby producing a reaction product. The method further includes removing an outlet gas including the reaction product from an outlet of the processing chamber, separating at least a portion of the reaction product from the outlet gas, and recirculating a portion of the outlet gas to the inlet of the processing chamber.

Abstract: A plasma assisted semiconductor substrate processing chamber having a plurality of electrically conductive bridges for preventing electrical arcing in the chamber. More particularly, the chamber has a plurality of electrically conductive bridges that connect a portion of a substrate support member with a portion of the chamber walls.