Patents by Inventor Michael Scaman

Michael Scaman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8174681
    Abstract: A method is provided for calibrating a model of a lithographic process that includes defining a parameter space of lithographic model parameters that are expected in an integrated circuit layout. The parameter space is defined according to bin values of a lithographic model parameter that span the range from a predetermined minimum and maximum value of the model parameter. The bin values may be incremented uniformly between the maximum and minimum parameter values, or may be distributed according to a weighting. The lithographic model is calibrated to an initial calibration test pattern. The resulting simulated calibration pattern is evaluated to determine whether the model parameter space is adequately populated. If the parameter space is over or under populated, the calibration pattern is modified until the calibration pattern test values adequately populate the parameter space, so that the final calibrated lithographic process model will more reliably predict images over the full range of image parameters.
    Type: Grant
    Filed: January 6, 2009
    Date of Patent: May 8, 2012
    Assignee: International Business Machines Corporation
    Inventors: Ioana Graur, Geng Han, Scott M. Mansfield, Michael Scaman
  • Publication number: 20100171031
    Abstract: A method is provided for calibrating a model of a lithographic process that includes defining a parameter space of lithographic model parameters that are expected in an integrated circuit layout. The parameter space is defined according to bin values of a lithographic model parameter that span the range from a predetermined minimum and maximum value of the model parameter. The bin values may be incremented uniformly between the maximum and minimum parameter values, or may be distributed according to a weighting. The lithographic model is calibrated to an initial calibration test pattern. The resulting simulated calibration pattern is evaluated to determine whether the model parameter space is adequately populated. If the parameter space is over or under populated, the calibration pattern is modified until the calibration pattern test values adequately populate the parameter space, so that the final calibrated lithographic process model will more reliably predict images over the full range of image parameters.
    Type: Application
    Filed: January 6, 2009
    Publication date: July 8, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ioana Graur, Geng Han, Scott M. Mansfield, Michael Scaman
  • Publication number: 20080104555
    Abstract: A computer program product for generating test patterns for a pattern sensitive algorithm. The program product includes code for extracting feature samples from a layout design; grouping feature samples into clusters; selecting at least one area from the layout design that covers a feature sample from each cluster; and saving each pattern layout covered by the at least one area as test patterns.
    Type: Application
    Filed: November 29, 2007
    Publication date: May 1, 2008
    Inventors: David DeMaris, Timothy Dunham, William Leipold, Daniel Maynard, Michael Scaman, Shi Zhong
  • Publication number: 20070108984
    Abstract: A method and apparatus for the non-contact electrical test of both opens and shorts in electronic substrates. Top surface electrical test features are exposed to an ionization source under ambient conditions and the subsequent charge build up is measured as a drain current by probes contacting corresponding bottom surface features. Opens are detected by an absence of a drain current and shorts are detected by turning off the ionization source and re-measuring the bottom surface probes with a varying bias applied to each probe in the array.
    Type: Application
    Filed: November 12, 2003
    Publication date: May 17, 2007
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Christopher Cline, Edward Yarmchuk, Vincent Arena, Donald Merte, Thomas Picunko, Brian Wojszynski, Charles Hendricks, Michael Scaman, Robert Olyha, Arnold Halperin
  • Publication number: 20070038970
    Abstract: A system and method for generating test patterns for a pattern sensitive algorithm. The method comprises the steps extracting feature samples from a layout design; grouping feature samples into clusters; selecting at least one area from the layout design that covers a feature sample from each cluster; and saving each pattern layout covered by the at least one area as test patterns.
    Type: Application
    Filed: August 12, 2005
    Publication date: February 15, 2007
    Applicant: International Business Machines Corporation
    Inventors: David DeMaris, Timothy Dunham, William Leipold, Daniel Maynard, Michael Scaman, Shi Zhong