Abstract: The present invention relates to a poly(oxyalkylated) alcohol composition represented by the formula:R.sub.1 O?CH.sub.2 CH(CH.sub.3)O!.sub.x (CH.sub.2 CH.sub.2 O).sub.y ?CH.sub.2 CH(OH)R.sub.2 !.sub.zwherein R.sub.1 is a linear, aliphatic hydrocarbon radical having from about 4 to about 18 carbon atoms including mixtures thereof; and R.sub.2 is a linear, aliphatic hydrocarbon radical having from about 2 to about 26 carbon atoms including mixtures thereof; x is an integer having a value from 1 to about 3; y is an integer having a value from 5 to about 30; and z is an integer having a value of from 1 to about 3. Also disclosed is an automatic dishwasher composition comprising the above-described epoxy-capped poly(oxyalkylated) alcohol and at least one component selected from the group consisting of detergent builder, bleach, anti-wear agent, and mixtures thereof.

Abstract: The present invention relates to a poly(oxyalkylated) alcohol composition represented by the formula:R.sub.1 O[CH.sub.2 CH(CH.sub.3)O].sub.x (CH.sub.2 CH.sub.2 O).sub.y [CH.sub.2 CH(OH)R.sub.2 ]wherein R.sub.1 is a linear, aliphatic hydrocarbon radical having from about 4 to about 18 carbon atoms including mixtures thereof; and R.sub.2 is a linear, aliphatic hydrocarbon radical having from about 2 to about 26 carbon atoms including mixtures thereof; x is an integer having a value from 1 to about 3; y is an integer having a value from 5 to about 30. Also disclosed is an automatic dishwasher composition comprising the above-described epoxy-capped poly(oxyalkylated) alcohol and at least one component selected from the group consisting of detergent builder, bleach, anti-wear agent, and mixtures thereof. Also disclosed is a cleaning composition for cleaning hard surfaces comprising an aqueous or organic solvent and the above-described epoxy-capped poly(oxyalkylated) alcohol as a surfactant.

Abstract: The present invention relates to novel compounds represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, n has a value from 1 to 6, R.sub.1 is selected from the group consisting of an alkyl group having from 1 to about 12 carbon atoms, H, or ##STR2## wherein the sum of n-m=3 to 12, Z.dbd.H or SO.sub.3 M and M.dbd.NH.sub.4, Na, or K. These compounds possess antimicrobial activity and are useful as cleaning agents and preservatives, particularly in water-base functional fluids and surface coating compositions.

Abstract: The present invention relates to novel compounds represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, n has a value of from 1 to 6, R.sub.1 is selected from the group consisting of an alkyl group having from 1 to about 12 carbon atoms, or ##STR2## where the sum of n+m=2 to 12. These compounds possess antimicrobial activity and are useful as cleaning agents and preservatives, particularly in water-based functional fluids and surface coating compositions.

Abstract: Novel nonionic antimicrobial amine glycidol compounds which may be used in cleaning compositions with anionics, nonionics or cationic surfactants as cleaning agents or a preservative in water-based functional fluids or surface coating compositions are represented by the formula: ##STR1## wherein R represents an alkyl group having from about 8 to about 18 carbon atoms and mixtures thereof,Y represents H, ##STR2## or R', and mixtures thereof; R' represents an alkyl group, the sum total of carbon atoms in R+R' being from about 8 to about 18;n is from about 1 to about 6; andm+n are from about 2 to about 12;wherein the molar ratio of amine glycidol compound to surfactant is from about 10:1 to about 1:10.

Abstract: Novel nonionic antimicrobial amine glycidol compounds which may be used in cleaning compositions with anionics, nonionics or cationic surfactants as cleaning agents or a preservative in water-based functional fluids or surface coating compositions are represented by the formula: ##STR1## wherein R is an alkyl group having from about 8 to about 18 carbon atoms, and mixtures thereof, R.sub.1 is selected from the group consisting of benzyl or an alkyl group having from 1 to about 12 carbon atoms, X is Cl, Br, or I, and n and m are from 1 to about 6.

Abstract: Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of an anionic sulfate ester of alkylphenol polyglycidol ether. Preferred embodiments of the anionic sulfate esters of alkylphenol polyglycidol ethers may be represented by the formula: ##STR1## wherein R represents an alkyl group having from about 4 to about 12 carbon atoms, x is from about 3 to about 15, M represents H, an alkali metal, an alkaline earth metal, ammonium, or an amine, and y is from 0.2 to about 4. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF to from about 3:1 to about 50:1. The novel etching solutions of the present invention have excellent wetting characteristics and retain their wetting properties after extended periods of continuous filtration through sub-micron filters.

Abstract: Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl amine glycidol adduct. Preferred embodiments of the nonionic alkyl amine glycidol adducts employed in the etching solution of the present invention are those represented by the formulas: ##STR1## wherein R represents an alkyl group having from about 8 to about 18 carbon atoms and mixtures thereof,Y represents H, ##STR2## or mixtures thereof; n is from about 1 to about 20; andm+n are from about 2 to about 20; or ##STR3## wherein R' and R" represent independently selected alkyl groups, the sum total of carbon atoms in R'+R" being from about 8 to about 18; andX is from 1 to about 20.The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF to from about 3:1 to about 50:1.

Abstract: Described are anionic surfactants which are made by (1) reacting maleic acid, fumaric acid, itaconic acid or mixtures thereof with at least one selected epoxy-capped poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) neutralizing said addition product with a sufficient amount of a neutralizing agent to convert at least a major proportion of said carboxylic acid groups to salt groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Abstract: Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkyl polysaccharide having the formula:RO(R'O).sub.x Z.sub.ywherein R is alkyl, alkylphenol, hydroxyalkyl, hydroxy alkylphenol, or mixtures thereof and said alkyl groups contain from about 6 to about 18 carbon atoms, R' contains from 1 to about 4 carbon atoms, x is from 0 to about 5, Z is a moiety derived from a reducing saccharide containing from 5 to 6 carbon atoms, and y is from about 1 to about 5. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF of from about 3:1 to about 50:1.The novel etching solutions of the present invention have excellent wetting characteristics, will not incorporate metallic ions, and retain their wetting properties after extended periods of continuous filtration.

Abstract: Etching solutions used to etch, for example, silicon dioxide coated substrates in the manufacture of integrated circuits comprise an aqueous solution of ammonium fluoride and a wetting amount of a nonionic alkylphenol polyglycidol ether having the formula: ##STR1## wherein R is an alkyl group having from about 4 to about 12 carbon atoms, and x is from about 3 to about 15. The etching solutions preferably contain hydrogen fluoride in a volume ratio of NH.sub.4 F to HF of from about 3:1 to about 50:1. The novel etching solutions of the present invention have excellent wetting characteristics, will not incorporate metallic ions, and retain their wetting properties after extended periods of continuous filtration.

Abstract: A calcium hypochlorite-containing emulsion having an emulsifying agent which comprises an oil soluble ethylene oxide adduct of an alkylphenol having from about 4 to about 7 moles of ethylene oxide and an oil soluble alkyl aryl sulfonate in a chlorinated organic solvent.This emulsion is suitable for decontaminating areas, structures and articles which have been contaminated with toxic chemical agents. The emulsion can be prepared from calcium hypochlorite compounds made from a wide variety of processes and can be used over a broad rang of climatic conditions. The emulsions are consistently formed very rapidly and can spread, penetrate and remain stable for sufficient amounts of time to provide complete neutralization of the contaminating agent.

Abstract: Described are anionic surfactants which are made by (1) reacting maleic acid or fumaric acid, or mixtures thereof with at least one selected poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) neutralizing said addition product with a sufficient amount of a neutralizing agent to convert at least a major proportion of said carboxylic acid groups to salt groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Abstract: Described are anionic surfactants which are made by (1) reacting maleic acid, fumaric acid, or mixtures thereof with at least one selected poly(oxyalkylated) alcohol in the presence of a peroxy-type free radical initiator to form a carboxylic acid group-containing addition product and (2) sulfating said addition product with a sufficient amount of a sulfating agent (i.e. sulfamic acid) to convert at least a major proportion of the terminal hydroxyl groups to sulfate groups. These surfactants exhibit excellent surface activity as well as being highly soluble in caustic solutions.

Abstract: Disclosed is a stable emulsion system which comprises:(a) an aqueous phase comprising water;(b) an organic phase comprising tris(tri-sec-butoxysiloxy)methylsilane; and(c) a surfactant having the formula: ##STR1## wherein n is from about 8 to about 16 and R' is either a methyl or ethyl group.

Abstract: Described are biodegradable surfactants useful as agricultural emulsifiers and having the formula: ##STR1## wherein R is a linear, alkyl hydrocarbon chain having an average from about 6 to about 10 carbon atoms; R' is a linear, alkyl hydrocarbon of 1 to about 4 carbon atoms; R" is a linear, alkyl hydrocarbon of from 1 to about 4 carbon atoms; x is an integer from about 8 to about 12; y is an integer from about 19 to about 25; and z is an integer from about 2 to 7.

Abstract: An improved sodium hydrosulfite dye reducing composition is described for reducing vat or sulfur dye in aqueous dye bath solutions, comprised of sodium dithionite, at least 1 percent sodium sulfite by weight of sodium dithionite, and stabilized by alkali metal hydroxide, the improvement characterized by including in this composition an effective surface crust inhibiting amount of an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl aryl phosphate esters, N-acyl-N-alkyl taurates, .alpha.-olefin sulfonates, alkyl aryl disulfonates, dodecylated oxydibenzene sulfonates, and mixtures thereof.

Abstract: Textile fabrics are bleached in a process which comprises contacting the textiles with an aqueous solution of dibasic magnesium hypoclorite. The bleaching solution is maintained at a pH of from about 3 to about 8 by the addition of an acid or acid salt.

Abstract: Novel surface active agents are disclosed having the formula: ##STR1## wherein R is hydrogen, an alkyl, alkenyl, aryl or aralkyl group; each R' is independently selected from the same group as R with the proviso that at least a majority of R' radicals attached to each Si atom are sterically hindered alkyl groups having at least 3 carbon atoms; each R''' independently is selected from hydrogen or methyl; and n is an integer of from about 10 to about 75.

Abstract: A process for the production of polychloroisocyanuric acids in which a depressant is added to the reaction mixture. The polychloroisocyanuric acid particles produced have improved filterability and the formation of foam during the reaction is greatly reduced. Depressants employed are alkali metal salts of alkyl esters or sulfonated alkyl esters of dicarboxylic acids or ethylene oxide terminated alkoxylated alcohols having a cloud point of up to about 50.degree. C.