Abstract: Medical scissors have handle parts and blades and are characterized in that they are coated, at least in the area of the blades, with an amorphous thin layer containing silicon, carbon and hydrogen, where the proportion of silicon is up to 100% atom parts in the boundary layer to the metallic body of the scissors, and up to 30% atom parts in the area of the outer surface of the layer.

Abstract: A method for applying a diamond-like coating to at least one substrate includes arranging at least one substrate in a reaction chamber so that field lines extend between the at least one substrate and a ground electrode and perpendicularly intersect a clamping surface defined by the at least one substrate or the field lines perpendicularly intersect the clamping surface at an end of the at least one substrate closest to the clamping surface; and applying a diamond-like layer to the at least one substrate by plasma-enhanced chemical vapor deposition by exciting a deposition gas atmosphere with electromagnetic radiation and producing an electrical bias voltage between the substrate and at least one ground electrode.

Abstract: A microwave apparatus injects microwave energy into a receptacle that is at least partially transparent to microwave energy. The receptacle has a window of microwave transparent material. The apparatus includes at least one microwave transmitter and one open microwave guide which is connected to the microwave transmitter and which is situated in the immediate vicinity of the receptacle. The open microwave guide has a plurality of parallel rungs and forming a slow - wave structure of the strapped bar type. The microwave guide is of a symmetrical V-shape, and at the apex of the V it is at a smaller distance from the window than at its feed point. A microwave feeder is disposed at at least both ends of the open microwave guide.

Abstract: Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.

Abstract: The invention concerns equipment for producing coatings having a rotationally symmetric thickness profile on substrates. The equipment comprises an evaporizing cathode and, for each substrate, a mask and a rotatable substrate holder arranged behind the mask. The mask has a cut-away portion such that the desired thickness profile of the coating can be produced by rotating the substrate.According to the invention and for the purpose of increasing the throughput of the equipment while maintaining close tolerances for the thickness profile of the coatings, a plurality of masks (6) and a plurality of substrate holders (13) associated with the masks are provided on a common movable frame (1). The movable frame (1) is displaceable relatively to the evaporizing cathode (10), continuous rotary movement being imparted to the substrate holders.

Abstract: To permit adhesion of a strain gauge grid applied to a high temperature plastic, such as a polyimide, the side of the strip of polyimide which is to be attached to the support frame, the strain of which is to be measured, has a solderable surface applied thereto which consists, essentially, of three sublayers, as follows:A first sub-layer of from 1 to 8 .mu.m thickness of chromium nickel alloy, containing, for example, about 20% (by weight) of chromium, or an iron chromium nickel alloy containing, for example, about 50% iron, 49% nickel and 1% chromium (by weight);a second sub-layer of at least about 5 .mu.m thickness, preferably about 7.5 .mu.m thickness of nickel and a third outer sub-layer of gold, for example, between about 4 to 10 .mu.m thick, preferably, about 7 .mu.m. The various sub-layers are applied, for example, after cleaning of the element with a volatile hydrocarbon, or toluol, by vapor deposition, for example, vaporization from a tungsten boat of the respective materials.