Abstract: An apparatus for monitoring a fluid system particularly suited for use with high pressure liquid chromatography systems. The apparatus monitors seal leakage as well as the general wellness of the apparatus and can thus be used to provide preventive maintenance feedback. The apparatus includes a liquid chamber, a wash chamber, a reservoir, a supply pump, a return line, and a detector. The liquid chamber includes a seal for sealing a fluid within the liquid chamber. The wash chamber is located adjacent the seal. The reservoir supplies a wash solution to the wash chamber. The supply pump supplies a unidirectional flow of wash solution from the reservoir to the wash chamber. The return line conveys a return flow from the wash chamber to the reservoir, in which the return flow includes any leakage of the fluid from the liquid chamber into the wash chamber and the portion of the wash solution that returns from the wash chamber to the reservoir.

Abstract: An apparatus for monitoring a fluid system particularly suited for use with high pressure liquid chromatography systems. The apparatus monitors seal leakage as well as the general wellness of the apparatus and can thus be used to provide preventive maintenance feedback. The apparatus includes a liquid chamber, a wash chamber, a reservoir, a supply pump, a return line, and a detector. The liquid chamber includes a seal for sealing a fluid within the liquid chamber. The wash chamber is located adjacent the seal. The reservoir supplies a wash solution to the wash chamber. The supply pump supplies a unidirectional flow of wash solution from the reservoir to the wash chamber. The return line conveys a return flow from the wash chamber to the reservoir, in which the return flow includes any leakage of the fluid from the liquid chamber into the wash chamber and the portion of the wash solution that returns from the wash chamber to the reservoir.