Abstract: The invention relates to a method for preparing a substrate comprising a sample reception area and a sensing area. The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

Abstract: The invention relates to a method for preparing a substrate (105a) comprising a sample reception area (110) and a sensing area (111). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

Abstract: The invention relates to a method for preparing a substrate (105a) comprising a sample reception area (110) and a sensing area (111). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.

Abstract: The present invention relates to a plasma texturing method for silicon based solar cells and the nanostructured silicon solar cells produced thereof. The silicon based solar cell comprises a silicon substrate having in at least part of its surface conical shaped nanostructures having an average height between 200 and 450 nm and a pitch between 100 and 200 nm, thereby achieving low reflectance and minimizing surface charge recombination.

Abstract: The present invention relates to a plasma texturing method for silicon based solar cells and the nanostructured silicon solar cells produced thereof. The silicon based solar cell comprises a silicon substrate having in at least part of its surface conical shaped nanostructures having an average height between 200 and 450 nm and a pitch between 100 and 200 nm, thereby achieving low reflectance and minimizing surface charge recombination.

Abstract: A substrate primarily for SERS determination, the substrate has a number of elongate elements with a density of at least 1×108 elongate elements per cm2 and having metal coated tips. When the elements may be made to lean toward each other, such as by providing a drop of a liquid thereon and allowing the liquid to dry, groups of tips of elongate elements are formed and the Raman enhancement is extremely high.

Abstract: A substrate primarily for SERS determination, the substrate has a number of elongate elements with a density of at least 1×108 elongate elements per cm2 and having metal coated tips. When the elements may be made to lean toward each other, such as by providing a drop of a liquid thereon and allowing the liquid to dry, groups of tips of elongate elements are formed and the Raman enhancement is extremely high.