Patents by Inventor Michael Stephen METCALFE

Michael Stephen METCALFE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Defined dosing atmospheric temperature and pressure vapor deposition system
    Patent number: 9562288
    Abstract: A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system.
    Type: Grant
    Filed: April 23, 2014
    Date of Patent: February 7, 2017
    Assignee: DIAMON FUSION INTERNATIONAL, INC.
    Inventors: Russell C. Slaybaugh, Michael Stephen Metcalfe, Adam Zax, Guillermo Seta
  • DEFINED DOSING ATMOSPHERIC TEMPERATURE AND PRESSURE VAPOR DEPOSITION SYSTEM
    Publication number: 20140322445
    Abstract: A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system.
    Type: Application
    Filed: April 23, 2014
    Publication date: October 30, 2014
    Applicant: DIAMON FUSION INTERNATIONAL, INC.
    Inventors: Russell C. SLAYBAUGH, Michael Stephen METCALFE, Adam ZAX, Guillermo SETA
  • DEFINED DOSING ATMOSPHERIC TEMPERATURE AND PRESSURE VAPOR DEPOSITION SYSTEM
    Publication number: 20140318449
    Abstract: A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system.
    Type: Application
    Filed: April 23, 2014
    Publication date: October 30, 2014
    Applicant: DIAMON FUSION INTERNATIONAL, INC.
    Inventors: Russell C. SLAYBAUGH, Michael Stephen METCALFE, Adam ZAX, Guillermo SETA