Patents by Inventor Michael Sugarman
Michael Sugarman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7980255Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluidnozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: GrantFiled: August 28, 2007Date of Patent: July 19, 2011Assignee: Applied Materials, Inc.Inventors: Younes Achkire, Alexander Lerner, Boris T. Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavleiv, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Publication number: 20100006124Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: ApplicationFiled: December 29, 2008Publication date: January 14, 2010Inventors: Younes Achkire, Alexander Lerner, Boris T. Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavleiv, Hoaquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Patent number: 7497932Abstract: The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes a spin-rinse-dry (SRD) station disposed between the loading station and the mainframe, a rapid thermal anneal chamber attached to the loading station, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.Type: GrantFiled: June 27, 2006Date of Patent: March 3, 2009Assignee: Applied Materials, Inc.Inventors: Yezdi Dordi, Donald J. Olgado, Ratson Morad, Peter Hey, Mark Denome, Michael Sugarman, Anna Marie Lloyd, legal representative, Joseph Stevens, Dan Marohl, Ho Seon Shin, Eugene Ravinovich, Robin Cheung, Ashok K. Sinha, Avi Tepman, Dan Carl, George Birkmaier, Mark Lloyd
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Publication number: 20070295371Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: ApplicationFiled: August 28, 2007Publication date: December 27, 2007Inventors: Younes Achkire, Alexander Lerner, Boris Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavleiv, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Publication number: 20070221249Abstract: In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.Type: ApplicationFiled: June 1, 2007Publication date: September 27, 2007Inventors: Michael Sugarman, Vladimir Galburt
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Patent number: 7226514Abstract: An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction.Type: GrantFiled: December 4, 2002Date of Patent: June 5, 2007Assignee: Applied Materials, Inc.Inventors: Anwar Husain, Brian J. Brown, David G. Andeen, Svetlana Sherman, John M. White, Michael Sugarman, Makoto Inagawa, Manoocher Birang
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Publication number: 20060246690Abstract: The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes a spin-rinse-dry (SRD) station disposed between the loading station and the mainframe, a rapid thermal anneal chamber attached to the loading station, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.Type: ApplicationFiled: June 27, 2006Publication date: November 2, 2006Inventors: Yezdi Dordi, Donald Olgado, Ratson Morad, Peter Hey, Mark Denome, Michael Sugarman, Mark Lloyd, Anna Lloyd, Joseph Stevens, Dan Marohl, Ho Shin, Eugene Ravinovich, Robin Cheung, Ashok Sinha, Avi Tepman, Dan Carl, George Birkmaier
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Publication number: 20060189465Abstract: A roller assembly is provided. The roller assembly comprises a groove that includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.Type: ApplicationFiled: April 28, 2006Publication date: August 24, 2006Inventors: Brian Brown, Michael Sugarman, Makoto Inagawa, Daniel Ramar, Alexander Lerner
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Publication number: 20060174921Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: ApplicationFiled: April 4, 2006Publication date: August 10, 2006Inventors: Younes Achkire, Alexander Lerner, Boris Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavleiv, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Patent number: 7063749Abstract: An apparatus for cleaning a substrate is provided. The apparatus comprises a plurality of rollers adapted to support a substrate in a vertical orientation, a scrubber brush adapted to contact a substrate supported by the plurality of rollers, and a sonic nozzle positioned at an elevation below the elevation of the scrubber brush and adapted so as to output a sonicated fluid spray that contacts a beveled edge or a major surface of the substrate such that fluid having sufficient sonic energy to harm the scrubber brush will not contact the scrubber brush.Type: GrantFiled: June 9, 2005Date of Patent: June 20, 2006Assignee: Applied MaterialsInventor: Michael Sugarman
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Publication number: 20060090774Abstract: In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the monitored torque to regulate the pressure applied to the wafer by the brush. Open loop positioning or closed loop control may be employed.Type: ApplicationFiled: December 15, 2005Publication date: May 4, 2006Inventors: Michael Sugarman, Vladimir Galburt
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Publication number: 20050268937Abstract: An apparatus for cleaning a substrate is provided. The apparatus comprises a plurality of rollers adapted to support a substrate in a vertical orientation, a scrubber brush adapted to contact a substrate supported by the plurality of rollers, and a sonic nozzle positioned at an elevation below the elevation of the scrubber brush and adapted so as to output a sonicated fluid spray that contacts a beveled edge or a major surface of the substrate such that fluid having sufficient sonic energy to harm the scrubber brush will not contact the scrubber brush.Type: ApplicationFiled: June 9, 2005Publication date: December 8, 2005Inventor: Michael Sugarman
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Publication number: 20050241684Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: ApplicationFiled: July 12, 2005Publication date: November 3, 2005Inventors: Younes Achkire, Alexander Lerner, Boris Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavleiv, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Publication number: 20050229426Abstract: In a first aspect, a first method of drying a substrate is provided. The first method includes the steps of (1) lifting a substrate through an air/fluid interface at a first rate; (2) directing a drying vapor at the air/fluid interface during lifting of the substrate; and (3) while a portion of the substrate remains in the air/fluid interface, reducing a rate at which a remainder of the substrate is lifted through the air/fluid interface to a second rate. The drying vapor may form an angle of about 23° with the air/fluid interface and/or the second rate may be about 2.5 mm/sec.Type: ApplicationFiled: February 9, 2005Publication date: October 20, 2005Inventors: Younes Achkire, Alexander Lerner, Boris Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavliev, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Patent number: 6955516Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.Type: GrantFiled: November 1, 2002Date of Patent: October 18, 2005Assignee: Applied Materials, Inc.Inventors: Younes Achkire, Alexander Lerner, Boris T. Govzman, Boris Fishkin, Michael Sugarman, Rashid Mavliev, Haoquan Fang, Shijian Li, Guy Shirazi, Jianshe Tang
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Patent number: 6921494Abstract: A scrubber device is provided. The scrubber device may etch a backside of a wafer and may clean a frontside of the wafer simultaneously. The scrubber device may comprise a programmed controller adapted to supply a non-etching fluid to a frontside of the wafer whenever an etching fluid is supplied to the backside of the wafer.Type: GrantFiled: June 6, 2003Date of Patent: July 26, 2005Assignee: Applied Materials, Inc.Inventors: Brian J. Brown, Madhavi Chandrachood, Radha Nayak, Fred C. Redeker, Michael Sugarman, John M. White
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Patent number: 6918864Abstract: A roller assembly is provided. The roller assembly comprises a groove that the includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.Type: GrantFiled: May 30, 2000Date of Patent: July 19, 2005Assignee: Applied Materials, Inc.Inventors: Brian J. Brown, Michael Sugarman, Makoto Inagawa, Daniel D. Ramar, Alexander Lerner
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Patent number: 6904637Abstract: An apparatus for cleaning a substrate is provided. The apparatus comprises a plurality of rollers adapted to support a substrate in a vertical orientation, a scrubber brush adapted to contact a substrate supported by the plurality of rollers, and a sonic nozzle positioned at an elevation below the elevation of the scrubber brush and adapted so as to output a sonicated fluid spray that contacts a beveled edge or a major surface of the substrate such that fluid having sufficient sonic energy to harm the scrubber brush will not contact the scrubber brush.Type: GrantFiled: October 3, 2001Date of Patent: June 14, 2005Assignee: Applied Materials, Inc.Inventor: Michael Sugarman
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Publication number: 20050109373Abstract: A roller assembly is provided. The roller assembly comprises a groove that includes two opposing surfaces. The roller assembly comprises either frictional surfaces positioned along the groove, or O-ring(s) coupled to the groove. The frictional surfaces may be a plurality of holes at spaced intervals along the opposing surfaces of the groove, a plurality of holes, each hole sized so as to extend into the two opposing surfaces, at spaced intervals along the opposing surfaces of the groove, or may be a bead-blasted surface or a knurled surface positioned along the opposing surfaces of the groove.Type: ApplicationFiled: January 4, 2005Publication date: May 26, 2005Inventors: Brian Brown, Michael Sugarman, Markoto Inagawa, Daniel Ramar, Alexander Lerner
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Patent number: 6820298Abstract: A brush mounting system for a wafer scrubbing device includes a brush mandrel and a mounting assembly on which the brush mandrel is mounted. The mounting assembly includes a mounting member adapted to be mounted to a wall of the wafer scrubbing device, and a bearing secured to the mounting member. A brush support is rotatably mounted on the bearing and has an outer end that includes a contact surface adapted to contact the brush mandrel. The contact surface has a spherical profile. The brush mandrel includes a corresponding contact surface having a spherical profile, so that the brush mandrel and the mounting assembly form a spherical joint at the point of contact.Type: GrantFiled: April 19, 2001Date of Patent: November 23, 2004Assignee: Applied Materials, Inc.Inventors: John M White, Ying Yu, Michael Sugarman