Abstract: Various embodiments are directed to systems, apparatus and methods for characterizing evanescent coupling parameters of a waveguide coupled to a resonator through variation of their relative positions. Various embodiments extend a local coupling approach with novel fitting capabilities that robustly determine the bare resonator modes and coupling parameters with quantified residual error and coupling parameter uncertainty estimates.

Abstract: Various embodiments are directed to systems, apparatus and methods for characterizing evanescent coupling parameters of a waveguide coupled to a resonator through variation of their relative positions. Various embodiments extend a local coupling approach with novel fitting capabilities that robustly determine the bare resonator modes and coupling parameters with quantified residual error and coupling parameter uncertainty estimates.

Abstract: An apparatus and method for shielding an operator from electromagnetic fields emitted from an antenna in a portable communication device. A plurality of active shields are placed between the operator's earpiece and the antenna to dampen the effects of the electromagentic fields. The active shields are coupled to adjustment circuits which may include variable gain amplifiers and phase couplers to offset the antenna signal.

Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.

Abstract: A grating fabrication process utilizes real-time measurement of a grating characteristic (such as, for example, grating period chirp, reflectivity, group delay) as a feedback error signal to modify the writing process and improve the characteristics of the finished grating. A test beam is launched through the optical medium during the writing process (or at the end of an initial writing process) and a particular characteristic is measured and used to generate a “corrective” apodization refractive index profile that can be incorporated with the grating to improve its characteristics. The improvements may be applied to a phase (or amplitude) mask used to write the grating (etching, local deformation, coating changes, for example), or the grating itself may be corrected using additional UV exposure, non-uniform annealing, non-uniform heating, and/or non-uniform tension—these techniques applied separately or in an intermittent sequence.