Patents by Inventor Michael T Ru

Michael T Ru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simultaneous selective polymer deposition and etch pitch doubling for sub 50nm line/space patterning
    Patent number: 7531102
    Abstract: First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second radicals combine to form a polymer layer on the layer in the center of the space, and substantially simultaneously, another portion of thee first radicals remove the underlying layer near the base of the photoresists. The first radicals may be fluorine-rich and the second radicals may be carbon-rich.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: May 12, 2009
    Assignee: Intel Corporation
    Inventors: Qiquan Geng, Jeff J Xu, Everett B Lee, Michael T Ru, Hsu-en Yang, Chung Hui