Patents by Inventor Michael Ten Bhomer

Michael Ten Bhomer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7130019
    Abstract: A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10?6/K.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: October 31, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Rutgerus Bartray, Wilhelmus Josephus Box, Carlo Cornelis Maria Luijten, Bernardus Antonius Johannes Luttikhuis, Michael Ten Bhomer, Ferdy Migchelbrink, Jan Jaap Kuit
  • Lithographic apparatus and device manufacturing method
    Patent number: 7061579
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10?6/K.
    Type: Grant
    Filed: December 16, 2003
    Date of Patent: June 13, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Pertrus Rutgerus Bartray, Wilhelmus Josephus Box, Bernardus Antonius Johannes Luttikhuis, Michael Ten Bhomer
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050151954
    Abstract: A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10?6/K.
    Type: Application
    Filed: November 12, 2004
    Publication date: July 14, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Petrus Bartray, Wilhelmus Box, Carlo Luijten, Bernardus Luttikhuis, Michael Ten Bhomer, Ferdy Migchelbrink, Jan Kuit
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050105070
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10?6/K.
    Type: Application
    Filed: December 16, 2003
    Publication date: May 19, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pertrus Bartray, Wilhelmus Box, Bernardus Antonius Luttikhuis, Michael Ten Bhomer