Patents by Inventor Michael Thier
Michael Thier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240005698Abstract: Aspects of the present disclosure relate to systems and methods for generating a predicted eye gaze of a user and or a predicted head pose of a user. In examples, feature information for a first eye of a user is generated based on a first image and a second image, where the first image is received from a first image sensor and the second image is received from a second image sensor. Feature information for a second eye of the user and facial landmark features are generated based on the first image and the second image. A predicted eye gaze for the user and/or a predicted head pose for the user may be based on the extracted feature information for the first eye, the second eye, and the extracted facial landmark features, and a confidence level for the predictions can be based on a hinge angle between the image sensors.Type: ApplicationFiled: June 29, 2022Publication date: January 4, 2024Applicant: Microsoft Technology Licensing, LLCInventors: Jonathan Michael THIER, Alexandros NEOPHYTOU, Eric CW SOMMERLADE
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Patent number: 8891172Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: March 11, 2009Date of Patent: November 18, 2014Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Patent number: 8508854Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: GrantFiled: December 13, 2010Date of Patent: August 13, 2013Assignee: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Patent number: 8325322Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: GrantFiled: February 4, 2010Date of Patent: December 4, 2012Assignee: Carl Zeiss SMT GmbHInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
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Publication number: 20110080569Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: December 13, 2010Publication date: April 7, 2011Applicant: Carl Zeiss SMT GmbHInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Publication number: 20100201958Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.Type: ApplicationFiled: February 4, 2010Publication date: August 12, 2010Applicant: Carl Zeiss SMT AGInventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
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Publication number: 20090257032Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.Type: ApplicationFiled: March 11, 2009Publication date: October 15, 2009Applicant: CARL ZEISS SMT AGInventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
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Patent number: 6796664Abstract: A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.Type: GrantFiled: March 12, 2003Date of Patent: September 28, 2004Assignee: Carl Zeiss SMT AGInventors: Jens Luedecke, Christoph Zazcek, Alexandra Pazidis, Jens Ullmann, Annette Muehlpfordt, Michael Thier, Stefan Wiesner
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Patent number: 6740159Abstract: A method of making a fracture-resistant large-size calcium fluoride single crystal is described, which is suitable for an optical component for radiation in the far UV range. The calcium fluoride raw material for the single crystal is first melted and subsequently solidified by cooling the melt to form a single crystal. However the calcium fluoride raw material is doped with from 1 to 250, preferably 1 to 100, ppm of strontium, preferably added as strontium fluoride, and contains from 1 to 10 ppm of sodium as well as up to 100 ppm of other impurities.Type: GrantFiled: August 28, 2002Date of Patent: May 25, 2004Assignees: Schott Glas, Carl Zeiss SMT AGInventors: Joerg Kandler, Ewald Moersen, Burkhard Speit, Harry Bauer, Thure Boehm, Eric Eva, Michael Thier, Hexin Wang, Frank Richter, Hans-Josef Paus
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Publication number: 20030210458Abstract: A method and a device for decontaminating optical surfaces, in particular for decontaminating the surfaces of beam-guiding optics employing UV-radiation in a cleansing atmosphere. The wavelength of the UV-radiation employed falls within a range where oxygen strongly absorbs and the cleansing atmosphere has an oxygen concentration less than that of air. The method and device have application to, e.g., cleaning the surfaces of the beam-guiding optics of microlithographic projection-exposure systems.Type: ApplicationFiled: March 12, 2003Publication date: November 13, 2003Applicant: CARL ZEISS SMT AGInventors: Jens Luedecke, Christoph Zazcek, Alexandra Pazidis, Jens Ullmann, Annette Muehlpfordt, Michael Thier, Stefan Wiesner
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Publication number: 20030101923Abstract: A method of making a fracture-resistant large-size calcium fluoride single crystal is described, which is suitable for an optical component for radiation in the far UV range. The calcium fluoride raw material for the single crystal is first melted and subsequently solidified by cooling the melt to form a single crystal. However the calcium fluoride raw material is doped with from 1 to 250, preferably 1 to 100, ppm of strontium, preferably added as strontium fluoride, and contains from 1 to 10 ppm of sodium as well as up to 100 ppm of other impurities.Type: ApplicationFiled: August 28, 2002Publication date: June 5, 2003Inventors: Joerg Kandler, Ewald Moersen, Burkhard Speit, Harry Bauer, Thure Boehm, Eric Eva, Michael Thier, Hexin Wang, Frank Richter, Hans-Josef Paus