Abstract: A method of autonomic organisation of network nodes is described. A first node is adapted to adopt a node role. The first node communicates with other network nodes over a stateless medium. The first node is provided with a pattern of complementary operations for operation between one node role and another node role. On adopting the node role in the network, the node interacts with a second node over the stateless medium according to the pattern of complementary operations between the node role of the first node and the node role of the second node. This approach may be used in autonomic networking. Suitable devices and software to implement this approach are described.

Abstract: A method of autonomic organisation of network nodes is described. A first node is adapted to adopt a node role. The first node communicates with other network nodes over a stateless medium. The first node is provided with a pattern of complementary operations for operation between one node role and another node role. On adopting the node role in the network, the node interacts with a second node over the stateless medium according to the pattern of complementary operations between the node role of the first node and the node role of the second node. This approach may be used in autonomic networking. Suitable devices and software to implement this approach are described.

Abstract: A sputter coating system comprises a vacuum chamber, means for generating a vacuum in the vacuum chamber, a gas feed system attached to the vacuum chamber, a gas plasma forming system attached to the vacuum chamber, a system for confining and guiding a gas plasma within the vacuum chamber, and a prism-shaped sputter target assembly, with the material to be sputtered forming at least the outer surface of the target assembly and positioned such that the outer surface is surrounded by the plasma within the vacuum chamber. A negative polarity voltage is applied to the surface of the material such that sputtering occurs.

Abstract: A sputter coating system comprises a vacuum chamber, means for generating a vacuum in the vacuum chamber, a gas feed system attached to the vacuum chamber, a gas plasma forming system attached to the vacuum chamber, a system for confining and guiding a gas plasma within the vacuum chamber, and a prism-shaped sputter target assembly, with the material to be sputtered forming at least the outer surface of the target assembly and positioned such that the outer surface is surrounded by the plasma within the vacuum chamber. A negative polarity voltage is applied to the surface of the material such that sputtering occurs.

Abstract: A seat belt retractor has a housing and a spool in the housing. A toothed ratchet wheel is coupled to the spool. A locking assembly has a lock bar pivotally mounted to the housing and moveable by means of a camming arrangement from an initial position clear of the ratchet wheel to a position whereby the lock bar locks the ratchet wheel to the housing. An adjustment mechanism enables adjustment of the initial position of the lock bar.

Abstract: A seat belt retractor has a housing and a spool in the housing. A toothed ratchet wheel is coupled to the spool. A locking assembly has a lock bar pivotally mounted to the housing and moveable by means of a camming arrangement from an initial position clear of the ratchet wheel to a position whereby the lock bar locks the ratchet wheel to the housing. An adjustment mechanism enables adjustment of the initial position of the lock bar.

Abstract: A process of depositing thin film coatings by evaporation in which a plasma is formed in an evacuated chamber and a source of material to be evaporated is provided which is evaporated to produce evaporated material. A substrate to be coated is located within the chamber and the evaporated material is caused to pass through the plasma and be to be deposited on the substrate. The plasma is generated by a helicon wave.