Abstract: A therapeutic medical garment having a variable pressure profile along its length, and including a knitted tubular body and a knitted anti-slip portion formed proximate one end of the tubular body with an inner surface adapted for residing against a wearer's skin. The knitted anti-slip portion includes at least first, second and third yarns simultaneously knitted to form a repeat having a raised surface texture on the inner surface of the anti-slip portion. One of the first, second and third yarns is a low-friction yarn, and two of the first, second and third yarns are high-friction yarns knitted to reside on and form the raised surface texture on the inner face of the anti-slip portion. A fabric construction and a method of forming a fabric construction are also disclosed.

Abstract: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, where a non-circular target pattern to be formed on a surface is input. A plurality of charged particle beam shots for a multi-beam charged particle beam system is determined, where the plurality of shots will form a pattern on the surface, each charged particle beam shot being a multi-beam shot comprising a plurality of circular or nearly-circular beamlets. The pattern on the surface matches the target pattern within a predetermined tolerance. The determining is performed using a computing hardware device.

Abstract: A method for fracturing or mask data preparation is disclosed, in which a set of shots is determined, where each shot will direct a circular or nearly-circular dosage pattern to a surface, where each shot comprises a shot dosage, and in which the set of shots is output. A method for forming patterns on a surface using charged particle beam lithography is also disclosed, in which a stencil is provided comprising one or more circular apertures, and where a plurality of circular patterns of different sizes are formed on the surface using a single aperture, by varying the shot dosage.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.

Abstract: A method for fracturing or mask data preparation is disclosed, in which a set of shots is determined, where each shot will direct a circular or nearly-circular dosage pattern to a surface, where each shot comprises a shot dosage, and in which the set of shots is output. A method for forming patterns on a surface using charged particle beam lithography is also disclosed, in which a stencil is provided comprising one or more circular apertures, and where a plurality of circular patterns of different sizes are formed on the surface using a single aperture, by varying the shot dosage.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of circular or nearly-circular shaped beam shots can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular shaped beam shots is also disclosed.

Abstract: A method for forming patterns on a surface using charged particle beam lithography is disclosed, in which a stencil is provided comprising first and second apertures, where circular or nearly-circular patterns in a first plurality of sizes are formed on the surface using the first aperture by varying shot dosage, and where circular or nearly-circular patterns in a second plurality of sizes are formed on the surface using the second aperture by varying shot dosage. A similar method for fracturing or mask data preparation is also disclosed. A stencil for charged particle beam lithography is also disclosed, where the stencil comprises first aperture and second apertures capable of forming, in one shot, patterns in a first and a second range of sizes on a surface by varying the shot dosage, where the first range of sizes is discontinuous with the second range of sizes.

Abstract: A therapeutic medical garment having a variable pressure profile along its length, and including a knitted tubular body and a knitted anti-slip portion formed proximate one end of the tubular body with an inner surface adapted for residing against a wearer's skin. The knitted anti-slip portion includes at least first, second and third yarns simultaneously knitted to form a repeat having a raised surface texture on the inner surface of the anti-slip portion. One of the first, second and third yarns is a low-friction yarn, and two of the first, second and third yarns are high-friction yarns knitted to reside on and form the raised surface texture on the inner face of the anti-slip portion. A fabric construction and a method of forming a fabric construction are also disclosed.

Abstract: A therapeutic medical garment having a variable pressure profile along its length and includes a knitted tubular body and a knitted anti-slip portion formed proximate one end of the tubular body with an inner surface adapted for residing against a wearer's skin. The knitted anti-slip portion includes at least first and second high friction yarns simultaneously knitted to form a repeat having a raised surface texture on the inner surface of the anti-slip portion. One of the first and second high friction yarns is a low-elasticity yarn, and at least one of the first and second high-friction yarns is knitted to reside on and form the raised surface texture on the inner face of the anti-slip portion.

Abstract: A method for forming patterns on a surface using charged particle beam lithography is disclosed, in which a stencil is provided comprising first and second apertures, where circular or nearly-circular patterns in a first plurality of sizes are formed on the surface using the first aperture by varying shot dosage, and where circular or nearly-circular patterns in a second plurality of sizes are formed on the surface using the second aperture by varying shot dosage. A similar method for fracturing or mask data preparation is also disclosed. A stencil for charged particle beam lithography is also disclosed, where the stencil comprises first aperture and second apertures capable of forming, in one shot, patterns in a first and a second range of sizes on a surface by varying the shot dosage, where the first range of sizes is discontinuous with the second range of sizes.

Abstract: A data-driven information navigation system and method enable search and analysis of a set of objects or other materials by certain common attributes that characterize the materials, as well as by relationships among the materials. The invention includes several aspects of a data-driven information navigation system that employs this navigation mode. The navigation system of the present invention includes features of a knowledge base, a navigation model that defines and enables computation of a collection of navigation states, a process for computing navigation states that represent incremental refinements relative to a given navigation state, and methods of implementing the preceding features.

Abstract: A method for manufacturing a semiconductor device is disclosed, wherein during the physical design process, a curvilinear path is designed to represent an interconnecting wire on the fabricated semiconductor device. A method for fracturing or mask data preparation (MDP) is also disclosed in which a manhattan path which is part of the physical design of an integrated circuit is modified to create a curvilinear pattern, and where a set of charged particle beam shots is generated, where the set of shots is capable of forming the curvilinear pattern on a resist-coated surface.

Abstract: A wing structure is provided, wherein the wing structure comprises; an upper covering, a lower covering, and a spar, the spar comprising; a spar web, an upper spar cap attached to the upper covering, and a lower spar cap attached to the lower covering, the wing structure also comprising a face spaced apart from the spar web extending between the upper and lower spar caps. The wing structure is arranged to contain fuel in a fuel containment area between the upper and lower coverings on one side of the spar web. The upper and lower spar caps extend from the spar web only on the other side of the spar web to the fuel containment area.

Abstract: A method for fracturing or mask data preparation for shaped beam charged particle beam lithography is disclosed, in which a square or nearly-square contact or via pattern is input, and a set of charged particle beam shots is determined which will form a circular or nearly-circular pattern on a surface, where the area of the circular or nearly-circular pattern is within a pre-determined tolerance of the area of the input square or nearly-square contact or via pattern. Methods for forming a pattern on a surface and for manufacturing a semiconductor device are also disclosed.

Abstract: A method, system, and program product, comprising: scheduling teacher evaluation events for teacher-evaluator pairs over a calendar date period to comply with compliance dates, comprising: selecting teachers evaluators to form a plurality of the teacher-evaluator pairs for teacher evaluation events, based on the teacher electronic calendars, evaluator calendars, teacher categories, and a time-table; scheduling respective dates and times for evaluation events over the course of the calendar period; changing the electronic calendars of the respective evaluators and the respective teachers to add the scheduled teacher evaluation events; running a software routine to wait for receipt of data indicating a new conflict event and changing date and/or time for evaluation events and/or forming new teacher-evaluator pairs; and changing the respective electronic calendars.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of circular or nearly-circular shaped beam shots can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular shaped beam shots is also disclosed.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which a plurality of shaped beam shots is determined which will form a target pattern on a surface, within a predetermined tolerance, where the plurality of shaped beam shots includes a plurality of circular or nearly-circular character projection (CP) shots plus one or more non-circular shot, and where at least two shots in the plurality of circular or nearly-circular shots overlap. Methods for manufacturing a surface and for manufacturing a semiconductor device on a substrate are also disclosed.

Abstract: A method for fracturing or mask data preparation for shaped beam charged particle beam lithography is disclosed, in which a square or nearly-square contact or via pattern is input, and a set of charged particle beam shots is determined which will form a circular or nearly-circular pattern on a surface, where the area of the circular or nearly-circular pattern is within a pre-determined tolerance of the area of the input square or nearly-square contact or via pattern. Methods for forming a pattern on a surface and for manufacturing a semiconductor device are also disclosed.

Abstract: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.

Abstract: A wing cover panel assembly, wing cover and method of forming thereof are disclosed in which an attachment surface of the wing cover panel is provided with a locating channel into which a wing structural element such as a stringer or spar is captured so as to fix the wing structural element to the wing cover panel.