Abstract: A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact. The memory layer has a variable resistance. The memory device also includes a top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a top contact on the top electrode; and a barrier layer, configured to substantially prevent conduction of ions or vacancies therethrough, wherein the barrier layer has a resistivity less than 1E-4 Ohm-m, where the barrier layer is between one of: A) the top electrode and the top contact, and B) the memory layer and the bottom contact.

Abstract: A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact. The memory layer has a variable resistance. The memory device also includes a top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a top contact on the top electrode; a first barrier layer, configured to substantially prevent the conduction of ions therethrough, where the first barrier layer is between the top electrode and the top contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m; and a second barrier layer, configured to substantially prevent the conduction of ions or vacancies therethrough, where the second barrier layer is between the memory layer and the bottom contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m.

Abstract: A memory device is disclosed. The memory device includes a bottom contact, and a memory layer connected to the bottom contact, where the memory layer has a variable resistance. The memory device also includes a conductive top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a lateral barrier layer connected to the bottom contact, the memory layer, and the conductive top electrode, where the lateral barrier layer is configured to substantially prevent conduction of ions or vacancies from the bottom contact, the memory layer, and the conductive top electrode to the lateral barrier layer.

Abstract: A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact, where the memory layer has a variable resistance. The device also includes a conductive top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The device also includes a retention layer between the memory layer and the top electrode, where the retention layer has an ionic conductivity which varies non-linearly with voltage.

Abstract: A memory device is disclosed. The memory device includes a bottom contact, and a memory layer connected to the bottom contact, where the memory layer has a variable resistance. The memory device also includes a conductive top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a lateral barrier layer connected to the bottom contact, the memory layer, and the conductive top electrode, where the lateral barrier layer is configured to substantially prevent conduction of ions or vacancies from the bottom contact, the memory layer, and the conductive top electrode to the lateral barrier layer.

Abstract: A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact. The memory layer has a variable resistance. The memory device also includes a top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a top contact on the top electrode; a first barrier layer, configured to substantially prevent the conduction of ions therethrough, where the first barrier layer is between the top electrode and the top contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m; and a second barrier layer, configured to substantially prevent the conduction of ions or vacancies therethrough, where the second barrier layer is between the memory layer and the bottom contact, and where the first barrier layer has a resistivity less than 1e-4 ohm-m.

Abstract: A memory device is disclosed. The memory device includes a bottom electrode. The memory device also includes a memory layer connected to the bottom electrode, where the memory layer has a variable resistance. The memory device also includes a conductive top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a retention layer between the memory layer and the top electrode, where the retention layer has a variable ionic conductivity, where the retention layer is configured to selectively resist ionic conduction, and where the resistivity of the retention layer is less than 1×10-4 ohm-m.

Abstract: In one embodiment, a capacitive circuit can include: (i) a resistive storage element having a solid electrolyte, a first electrode coupled to a first side of the solid electrolyte, and a second electrode coupled to a second side of the solid electrolyte; (ii) the resistive storage element being configured to be programmed to a low resistance state by application of a program voltage in a forward bias direction to form a conductive path between the first and second electrodes, and being configured to be erased to a high resistance state by application of an erase voltage in a reverse bias direction to substantially dissolve the conductive path; and (iii) a first capacitor having the first electrode coupled to a first side of a first oxide layer, and a third electrode coupled to a second side of the first oxide layer.

Abstract: A resistive switching memory device can include a plurality of resistive memory cells, where each of the resistive memory cells includes: (i) a first diode having an anode coupled to a first word line and a cathode coupled to a common node; (ii) a second diode having an anode coupled to the common node and a cathode coupled to a second word line; and (iii) a resistive storage element having an anode coupled to a bit line and a cathode coupled to the common node, wherein the resistive memory cell is configured to be programmed to a low resistance state by application of a program voltage in a forward bias direction, and to be erased to a high resistance state by application of an erase voltage in a reverse bias direction.

Abstract: A memory element programmable between different impedance states can include a first electrode; a switching layer formed in contact with the first electrode and including at least one metal oxide; and a buffer layer in contact with the switching layer. A buffer layer can include a first metal, tellurium, a third element, and a second metal distributed within the buffer layer. A second electrode can be in contact with the buffer layer.

Abstract: A memory cell string is disclosed. The memory cell string includes a first select gate that includes a first plurality of elements. A plurality of wordlines are coupled to the first select gate and a second select gate, that includes a second plurality of elements, is coupled to the plurality of wordlines. The distances between one element of the first and the second plurality of elements and the plurality of wordlines are the same as the distances that exist between each wordline of the plurality of wordlines.

Abstract: A self sensing reference system and method are described. The self sensing reference systems and methods facilitate efficient accurate access to information. In one embodiment, a self sensing reference system includes a main cascode component, a self referencing component, and a comparison verification component. The main cascode component receives input on a first current value and a second current value. The self referencing component establishes a plurality of data indications wherein a first data indication is established based upon a comparison of the first current value to the second current value. A comparison verification component verifies a second data indication.

Abstract: One aspect of the present invention relates to a semiconductor transistor device with an annular gate surrounding, at least in part, a channel that conducts current between a first and second source/drain. Another aspect of the present invention relates to a semiconductor transistor device having an annular gate and containing a channel composed of a polymer material. Yet another aspect of the present invention relates to fabrication of a device utilizing a polymer channel surrounded, at least in part, by an annular gate. Still yet another aspect of the present invention relates to a system with a means to control (and/or amplify) current via an annular gate surrounding a channel which conducts current between a first and second source/drain. Still other aspects of the present invention include devices incorporating the present invention's devices, systems and methods such as computers, memory, handhelds and electronic devices.

Abstract: The present invention pertains to a technique for determining the level of a bit in a dual sided ONO flash memory cell where each of the bits of the dual sided ONO flash memory cell can be programmed to multiple levels. One or more aspects of the present invention take into consideration the affect that the level of charge on one bit can have on the other bit, otherwise known as complimentary bit disturb. A metric known as transconductance is utilized in making the bit level determination to provide a greater degree of resolution and accuracy. In this manner, determining the bit level in accordance with one or more aspects of the present invention mitigates false or erroneous reads.

Abstract: Systems and methods employing at least one constant current source to facilitate programming of an organic memory cell and/or employing at least one constant voltage source to facilitate erasing of a memory device. The present invention is utilized in single memory cell devices and memory cell arrays. Employing a constant current source prevents current spikes during programming and allows accurate control of a memory cell's state during write cycles, independent of the cell's resistance. Employing a constant voltage source provides a stable load for memory cells during erase cycles and allows for accurate voltage control across the memory cell despite large dynamic changes in cell resistance during the process.

Abstract: Systems and methods are disclosed that facilitate providing a selective functionality to a polymer memory cell in a memory array while increasing device density in the memory cell array. A vertical JFET is described to which voltages can be selectively applied to control internal current flow there through, which in turn can be employed to manipulate the state of a polymer memory cell coupled to the vertical JFET. By mitigating gaps between gates, or wordlines, and drains of the vertical JFETs, feature size can be reduced to permit increased device density. Furthermore, vertical JFETs in the array can be coupled to gates on only two opposite sides, permitting the JFETs to be arranged without gate crossbars between them, further increasing device density. In this manner, the present invention provides switching characteristics to a memory cell and overcomes problematic bulkiness associated with conventional MOS devices.

Abstract: A memory cell made of two electrodes with a controllably conductive media between the two electrodes is disclosed. The controllably conductive media contains an active low conductive layer and passive layer. The controllably conductive media changes its impedance when an external stimuli such as an applied electric field is imposed thereon. Methods of making the memory devices/cells, methods of using the memory devices/cells, and devices such as computers containing the memory devices/cells are also disclosed.

Abstract: A bank selector encoder comprises a partition indicator circuit having a plurality of partition boundary indicator terminals, a plurality of inverters arranged in a plurality of columns, with each column of the inverters coupled to a respective one of a plurality of columns of ROM cells in a ROM array and a plurality of bank selector code outputs coupled to respective columns of the inverters. The partition boundary indicator terminals are capable of designating a memory partition boundary to identify an upper memory bank and a lower memory bank. The bank selector encoder is capable of generating an identifying bank selector code for each of a plurality of the predetermined memory partition boundaries. The bank selector encoder outputs code bits of a bank selector code based upon the partition boundary indicator terminals.

Abstract: An non-volatile read only memory transistor for use in a memory array is disclosed. The non-volatile read only memory transistor features a substantially vertically oriented channel fabricated in a trench formed in the substrate. The channel length is dependent upon the depth of the trench and therefore a dense array of NROM transistors can be formed without adversely affecting the channel length and therefore the operational performance of the transistor.

Abstract: An erase operation is performed on a non-volatile memory cell with an oxide-nitride-oxide structure by using a negative gate erase voltage during an erase procedure to improve the speed and performance of the non-volatile memory cell after many program-erase cycles. During the erase procedure, an erase cycle is applied followed by a read cycle until the cell has a threshold erased below a desired value. For the initial erase cycle in the procedure, an initial negative gate voltage is applied. In subsequent erase cycles, a sequentially decreasing negative gate voltage is applied until the threshold is reduced below the desired value. In one embodiment, after erase is complete, the last negative gate voltage value applied is stored in a separate memory. After a subsequent programming when the erase procedure is again applied, the initial negative gate voltage applied is the negative gate voltage value for the cell stored in memory.