Abstract: Methods, apparatus, systems, and computer-readable media are provided for employing an environment of sensor arrays at an air handling unit. Each sensor array can include one or more sensors for collecting data related to a portion of an air handling unit. Additionally, each sensor can be in communication with each other and/or each sensor array can be in communication with a remote server for processing the collected data. The collected data can be correlated in order to identify how various portions of the air handling unit are affected by other portions of the air handling unit and other systems that are external to the air handling unit. For instance, certain properties of motor and/or filter operations can be indicative of heating and/or cooling coil fouling and/or changes in air pressure of rooms served by an air handling unit.

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.

Abstract: A method may include providing a substrate on a clamp, and directing radiation from an illumination source to the substrate when the substrate is disposed on the clamp during substrate processing, wherein the radiation is characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to a front side of the substrate, opposite the back side of the substrate.

Abstract: A method may include providing a substrate in a process chamber, directing radiation from an illumination source to the substrate when the substrate is disposed in the process chamber, and processing the substrate by providing a processing species to the substrate, separate from the radiation, when the substrate is disposed in the process chamber. As such, the radiation may be characterized by a radiation energy, wherein at least a portion of the radiation energy is equal to or greater than 2.5 eV.

Abstract: A system and method for reduced workpiece adhesion during removal from a semiconductor processing station. The system provides an electrostatic charge detector that measures the residual charge on an electrostatically clamped workpiece prior to removal from a processing station inside the semiconductor processing tool. One embodiment uses an algorithm that to predict when to remove the workpiece without electrostatic adhesion based upon the decay rate of the residual electrostatic charge (Q) on the workpiece. Other embodiments also provide for a processing station static charge buildup health check and an excessive static charge check on incoming workpieces.

Abstract: Methods, apparatus, systems, and computer-readable media are provided for employing an environment of sensor arrays at an air handling unit. Each sensor array can include one or more sensors for collecting data related to a portion of an air handling unit. Additionally, each sensor can be in communication with each other and/or each sensor array can be in communication with a remote server for processing the collected data. The collected data can be correlated in order to identify how various portions of the air handling unit are affected by other portions of the air handling unit and other systems that are external to the air handling unit. For instance, certain properties of motor and/or filter operations can be indicative of heating and/or cooling coil fouling and/or changes in air pressure of rooms served by an air handling unit.

Abstract: The present disclosure is related to an air filter operation and use modification system. The system properly determines average filter resistance based upon determined air velocities in the air handling unit. Once accurate average filter resistance is determined, various energy use measurement determinations can be made for a proposed filter in the system. Such determinations can be based on estimated or desired filter energy use measurements. The system can modify the air handling unit operations to meet the proposed filter energy use measurements. Furthermore, the user will have the ability to review the range of potential operational points and then be able to select the service cycle based on the air handling unit owner's preferred preventive maintenance and budget cycles.

Abstract: A system and method for reduced workpiece adhesion during removal from a semiconductor processing station. The system provides an electrostatic charge detector that measures the residual charge on an electrostatically clamped workpiece prior to removal from a processing station inside the semiconductor processing tool. One embodiment uses an algorithm that to predict when to remove the workpiece without electrostatic adhesion based upon the decay rate of the residual electrostatic charge (Q) on the workpiece. Other embodiments also provide for a processing station static charge buildup health check and an excessive static charge check on incoming workpieces.

Abstract: An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generating a control signal responsive to a measurement signal, the control signal to adjust operation of the plasma flood gun to a target operating level. At the target operating level the flux of electrons may comprise a stabilizing dose of electrons, the stabilizing concentration of electrons, the stabilizing concentration reducing a clamp current variation in the electrostatic clamp to a target value, the target value being less than a second value of clamp current variation when the plasma flood gun is not operating.

Abstract: An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generating a control signal responsive to a measurement signal, the control signal to adjust operation of the plasma flood gun to a target operating level. At the target operating level the flux of electrons may comprise a stabilizing dose of electrons, the stabilizing concentration of electrons, the stabilizing concentration reducing a clamp current variation in the electrostatic clamp to a target value, the target value being less than a second value of clamp current variation when the plasma flood gun is not operating.

Abstract: An apparatus having one or more filters positioned by a connection member. The connection member orientates one or more filters at a transverse angle relative to the horizontal to drain contaminants from the filter.

Abstract: A HEPA filter which utilizes spun bond scrim material and ePTFE membrane for use in an aseptic pharmaceutical filtration air handling system for installation and testing is provided. The installation and testing configuration includes the ePTFE filter with a low or ultra-low concentration of challenging aerosol in the upstream side of the filter along with a scanning device for determining the upstream concentration, all completed in situ within a pharmaceutical air handling system. At the downstream side of the ePTFE filter is positioned another scanner which may be a discrete particle scanner for calculating the penetration percentage of the aerosol through the filtering media of ultra-low concentrations. The system and configuration allows for exposure to ePTFE filtration media for certification by low or ultra-low concentrations of oil based challenging compounds.

Abstract: An apparatus having one or more filters positioned by a connection member. The connection member orientates one or more filters at a transverse angle relative to the horizontal to drain contaminants from the filter.

Abstract: Systems and methods for generating low or ultra-low concentrations of oil-based challenging compounds for filtration media are provided. Embodiments of the generators utilize bypass air in addition to the source of challenge. A HEPA filter which utilizes spunbond scrim material and ePTFE membrane for use in an aseptic pharmaceutical filtration air handling system for installation and testing is provided. The installation and testing configuration includes the ePTFE filter with a low or ultra-low concentration of challenging aerosol in the upstream side of the filter along with a scanning device for determining the upstream concentration, all completed in situ within a pharmaceutical air handling system. At the downstream side of the ePTFE filter is positioned another scanner which may be a discrete particle counter. The system and configuration allows for exposure to ePTFE filtration media for certification by low or ultra-low concentrations of oil based challenging compounds.

Abstract: An odor filtration media having a chemical reagent which removes odor causing fluid contaminants from a fluid stream through the use of granular or shaped media have a chemical composition including permanganate is provided. A method of producing the odor absorbing media having a chemical reagent is also provided and comprises the steps of mixing H2O, KMnO4, and at least one salt adding ions or ionic compounds selected from the group consisting of Na+, Li+, K+, NH4+, Cl?, SO42?, BO32?, CO32?, PO43?, NO3? and combinations thereof, or from the group consisting of Na+, Li+, K+, NH4+, Mg2+, Ca2+, Cl?, BO32?, NO3? and combinations thereof, forming an impregnating solution. The impregnating solution is heated and combined with a support material to form a coherent mass.

Abstract: Systems and methods for generating low or ultra-low concentrations of oil-based challenging compounds for filtration media are provided. Embodiments of the generators utilize bypass air in addition to the source of challenge. A HEPA filter which utilizes spunbond scrim material and ePTFE membrane for use in an aseptic pharmaceutical filtration air handling system for installation and testing is provided. The installation and testing configuration includes the ePTFE filter with a low or ultra-low concentration of challenging aerosol in the upstream side of the filter along with a scanning device for determining the upstream concentration, all completed in situ within a pharmaceutical air handling system. At the downstream side of the ePTFE filter is positioned another scanner which may be a discrete particle counter. The system and configuration allows for exposure to ePTFE filtration media for certification by low or ultra-low concentrations of oil based challenging compounds.