Patents by Inventor Michael Widmann

Michael Widmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200180374
    Abstract: In order to improve a coupling unit that is mountable on the rear end of a vehicle body and comprises a carrier unit which, for its part, is mountable on the vehicle body hidden by a bumper unit and which comprises a coupling arm held on the carrier unit for coupling a trailer or a rear load carrier, in such a way that detection of the mechanical loads on the coupling unit is possible in a simple way, it is proposed that there be provided at least one force detecting region on sections of the coupling unit that are mechanically loaded by the coupled trailer or the coupled rear load carrier, in which a sensor associated with this force detecting region detects the mechanical load acting on this force detecting region by means of the magneto-elastic effect.
    Type: Application
    Filed: December 10, 2019
    Publication date: June 11, 2020
    Inventors: Wolfgang Gentner, Alexander Kaufmann, Michael Widmann
  • Patent number: 9604299
    Abstract: A method and a device for the material-fit connection of an optical element to a frame are disclosed.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: March 28, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Armin Schoeppach, Johnannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-Joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht
  • Publication number: 20150008215
    Abstract: A method and a device for the material-fit connection of an optical element to a frame are disclosed.
    Type: Application
    Filed: March 6, 2014
    Publication date: January 8, 2015
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Armin Schoeppach, Johnannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-Joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht
  • Patent number: 8705006
    Abstract: A method and a device for the material-fit connection of an optical element to a frame are disclosed.
    Type: Grant
    Filed: March 13, 2009
    Date of Patent: April 22, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Armin Schoeppach, Johannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-Joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht
  • Patent number: 8279402
    Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: October 2, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stephan Six, Michael Lill, Ruediger Duesing, Bernhard Gellrich, Michael Widmann, Andreas Schubert, Tilmann Von Papen, Thomas Ihl
  • Publication number: 20090244508
    Abstract: A method and a device for the material-fit connection of an optical element to a frame are disclosed.
    Type: Application
    Filed: March 13, 2009
    Publication date: October 1, 2009
    Applicant: Carl Zeiss SMT AG
    Inventors: Armin Schoeppach, Johannes Rau, Gennady Fedosenko, Leonid Gorkhover, Gerd Klose, Stefan Wiesner, Hans-Joachim Trefz, Michael Widmann, Ulrich Bingel, Claudia Ekstein, Guenter Albrecht
  • Publication number: 20090233233
    Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
    Type: Application
    Filed: March 12, 2009
    Publication date: September 17, 2009
    Applicant: Carl Zeiss SMT AG
    Inventors: Stephan SIX, Michael Lill, Ruediger Duesing, Bernhard Gellrich, Michael Widmann, Andreas Schubert, Tilmann Von Papen, Thomas Ihl