Patents by Inventor Michael Woitge

Michael Woitge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Control of the deposition temperature to reduce the via and contact resistance of Ti and TiN deposited using ionized PVD techniques
    Patent number: 6673716
    Abstract: A method of depositing thin films comprising Ti and TiN within vias and trenches having high aspect ratio openings. The Ti and TiN layers are formed on an integrated circuit substrate using a Ti target in a non-nitrided mode in a hollow cathode magnetron apparatus in combination with controlling the deposition temperatures by integrating cooling steps into the Ti/TiN deposition processes to modulate the via and contact resistance. The Ti and TiN layers are deposited within a single deposition chamber, without the use of a collimator or a shutter.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: January 6, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Gerard C. D'Couto, George Tkach, Michael Woitge, Michal Danek