Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media, for workload automation and job scheduling information. One of the methods includes obtaining job dependency information, the job dependency information specifying an order of execution of a plurality of jobs. The method also includes obtaining data lineage information that identifies dependency relationships between data stores and transformation, wherein at least one transformation accepts data from a first data store and produces data for a second data store. The method also includes creating links between the job dependency information and the data lineage information. The method also includes determining an impact of a change in a planned execution of an application of the plurality of applications based on the job dependency information, the created links, and the data lineage information.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media, for workload automation and job scheduling information. One of the methods includes obtaining job dependency information, the job dependency information specifying an order of execution of a plurality of jobs. The method also includes obtaining data lineage information that identifies dependency relationships between data stores and transformation, wherein at least one transformation accepts data from a first data store and produces data for a second data store. The method also includes creating links between the job dependency information and the data lineage information. The method also includes determining an impact of a change in a planned execution of an application of the plurality of applications based on the job dependency information, the created links, and the data lineage information.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media, for workload automation and job scheduling information. One of the methods includes obtaining job dependency information, the job dependency information specifying an order of execution of a plurality of jobs. The method also includes obtaining data lineage information that identifies dependency relationships between data stores and transformation, wherein at least one transformation accepts data from a first data store and produces data for a second data store. The method also includes creating links between the job dependency information and the data lineage information. The method also includes determining an impact of a change in a planned execution of an application of the plurality of applications based on the job dependency information, the created links, and the data lineage information.

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage media, for workload automation and job scheduling information. One of the methods includes obtaining job dependency information, the job dependency information specifying an order of execution of a plurality of jobs. The method also includes obtaining data lineage information that identifies dependency relationships between data stores and transformation, wherein at least one transformation accepts data from a first data store and produces data for a second data store. The method also includes creating links between the job dependency information and the data lineage information. The method also includes determining an impact of a change in a planned execution of an application of the plurality of applications based on the job dependency information, the created links, and the data lineage information.

Abstract: A piezo-TFT cantilever microelectromechanical system (MEMS) and associated fabrication processes are provided. The method comprises: providing a substrate, such as glass for example; forming thin-films overlying the substrate; forming a thin-film cantilever beam; and simultaneously forming a TFT within the cantilever beam. The TFT is can be formed least partially overlying a cantilever beam top surface, at least partially overlying a cantilever beam bottom surface, or embedded within the cantilever beam. In one example, forming thin-films on the substrate includes: selectively forming a first layer with a first stress level; selectively forming a first active Si region overlying the first layer; and selectively forming a second layer overlying the first layer with a second stress level. The thin-film cantilever beam is formed from the first and second layers, while the TFT source/drain (S/D) and channel regions are formed from the first active Si region.

Abstract: A MEMS pixel sensor is provided with a thin-film mechanical device having a mechanical body, with a mechanical state responsive to a proximate environment. A thin-film electronic device converts the mechanical state into electrical signals. A pixel interface supplies power to the electronic device and transceives electrical signals. The sensor is able to operate dynamically, in real-time. For example, if the mechanical device undergoes a sequence of mechanical states at a corresponding plurality of times, the electronic device is able to supply a sequence of electrical signals to the pixel interface that are responsive to the sequence of mechanical states, at the plurality of times. Each MEMS pixel sensor may include a number of mechanical devices, and corresponding electronic devices, to provide redundancy or to measure a broadband response range.

Abstract: A piezo-TFT cantilever microelectromechanical system (MEMS) and associated fabrication processes are provided. The method comprises: providing a substrate, such as glass for example; forming thin-films overlying the substrate; forming a thin-film cantilever beam; and simultaneously forming a TFT within the cantilever beam. The TFT is can be formed least partially overlying a cantilever beam top surface, at least partially overlying a cantilever beam bottom surface, or embedded within the cantilever beam. In one example, forming thin-films on the substrate includes: selectively forming a first layer with a first stress level; selectively forming a first active Si region overlying the first layer; and selectively forming a second layer overlying the first layer with a second stress level. The thin-film cantilever beam is formed from the first and second layers, while the TFT source/drain (S/D) and channel regions are formed from the first active Si region.