Abstract: A system, methods, and techniques are provided for performing automated operations to track one or more physiological indicators of a user via hardware capabilities of a computing device associated with the user, and/or of external monitoring devices communicatively coupled to such a user computing device. Feedback regarding such tracked activities may be provided to the user via one or more guided physiological and/or exercises. The system may enable the user to interactively create and/or experience audiovisual artworks that may include still images, music, dynamic sound effects, and animations, such as animations depicting the creation of one or more related artworks.

Abstract: A system, methods, and techniques are provided for performing automated operations to track one or more physiological indicators of a user via hardware capabilities of a computing device associated with the user, and/or of external monitoring devices communicatively coupled to such a user computing device. Feedback regarding such tracked activities may be provided to the user via one or more guided physiological and/or exercises. The system may enable the user to interactively create and/or experience audiovisual artworks that may include still images, music, dynamic sound effects, and animations, such as animations depicting the creation of one or more related artworks.

Abstract: A system, methods, and techniques are provided for performing automated operations to track one or more physiological indicators of a user via hardware capabilities of a computing device associated with the user, and/or of external monitoring devices communicatively coupled to such a user computing device. Feedback regarding such tracked activities may be provided to the user via one or more guided physiological and/or exercises. The system may enable the user to interactively create and/or experience audiovisual artworks that may include still images, music, dynamic sound effects, and animations, such as animations depicting the creation of one or more related artworks.

Abstract: Systems and methods for verifying the presence of an attendee in an education session include providing, by a computer hardware processor, information for a codified sound to a leader of the education session, where the leader is located in a substantially enclosed space in which the education session is held. The codified sound represents a leader code. The codified sound is emitted from a first device associated with the leader. A sound signal is received by a second device associated with the attendee. An attendee code is determined from the sound signal received by the second device. The system, such as using the computer hardware processor or the second device, determines whether the attendee code matches the leader code.

Abstract: Systems and methods for verifying the presence of an attendee in an education session include providing, by a computer hardware processor, information for a codified sound to a leader of the education session, where the leader is located in a substantially enclosed space in which the education session is held. The codified sound represents a leader code. The codified sound is emitted from a first device associated with the leader. A sound signal is received by a second device associated with the attendee. An attendee code is determined from the sound signal received by the second device. The system, such as using the computer hardware processor or the second device, determines whether the attendee code matches the leader code.

Abstract: An improved LOCOS device isolation method for forming a field oxide is disclosed having the advantage of controllable and uniform sidewall framing of a nutride oxidation mask. This advantage is achieved by the use of a polysilicon layer overlying a nitride mask with the polysilicon providing an etching endpoint during the anisotropic etching used for sidewall formation. In one embodiment of the invention a silicon substrate is provided having a pad oxide formed on its surface and a first polysilicon stress-relief buffer layer formed overlying the pad oxide. A first nitride layer, to be used for oxidation masking during field oxide growth, is deposited overlying the first polysilicon layer. Next, a second polysilicon, etch-resistant buffer layer is deposited overlying the first nitride layer.The first nitride layer and second polysilicon layer are patterned by conventional lithography while the first polysilicon and pad oxide layers remained unpatterned.