Patents by Inventor Michael Y. Au

Michael Y. Au has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8038858
    Abstract: An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.
    Type: Grant
    Filed: November 7, 2005
    Date of Patent: October 18, 2011
    Assignee: Alameda Applied Sciences Corp
    Inventors: Brian L. Bures, Jason D. Wright, Michael Y. Au, Andrew N. Gerhan, Mahadevan Krishnan
  • Patent number: 7053333
    Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: May 30, 2006
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan
  • Patent number: 6818853
    Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: November 16, 2004
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan