Patents by Inventor Michael Yu
Michael Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240400647Abstract: A modified collagen hybridizing peptide (CHP) may include one or more binding partners crosslinked to a CHIP. The CHP has a sequence represented by Formula (I): (Gly-X-Y)a-b, wherein Gly is glycine, at least one of X and Y is proline, modified proline and/or hydroxy proline, and a is 3 and b is 20. The one or more binding partners is selected from the group consisting of integrin sites, integrin binding sites, crosslinking sites, von Willebrand Factor (VWF) discoidin domain receptor (DDR) 1, DDR 2, SPARC binding peptides, fibronectin binding peptides, engineered integrin binding peptides, matrix metalloproteinase (MMP) cleavage sites. Cathepsin K (CATK) sites, and osteoclast-associated receptors (OSCAR).Type: ApplicationFiled: October 7, 2022Publication date: December 5, 2024Applicant: 3HELIX, INC.Inventors: Lucas BENNINK, Michael KIRKNESS, Julian KESSLER, Michael YU
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Publication number: 20240184024Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a film stack disposed on a substrate without planarization. The method includes forming a hardmask on a top surface of a film stack. Forming a mask material on a portion of the top surface and a portion of the hardmask. Etching the top surface. Trimming the mask. Etching the top surface again. Trimming the mask a second time. Etching the top surface yet again and then stripping the mask material.Type: ApplicationFiled: February 12, 2024Publication date: June 6, 2024Inventors: Michael Yu-tak YOUNG, Ludovic GODET, Robert Jan VISSER, Naamah ARGAMAN, Christopher Dennis BENCHER, Wayne MCMILLAN
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Patent number: 11959921Abstract: A method for forming dendritic mesoporous nanoparticles comprising preparing a mixture containing one or more polymer precursors, a silica precursor, and a compound that reacts with silica and reacts with the polymer or oligomer formed from the one or more polymer precursors, and stirring the mixture whereby nanoparticles are formed, and subsequently treating the nanoparticles to form dendritic mesoporous silica nanoparticles or dendritic mesoporous carbon nanoparticles. The silica precursor may comprise tetraethyl orthosilicate (TEOS), the one or more polymer precursors may comprise 3-aminophenol and formaldehyde and the compound may be ethylene diamine (EDA). There is a window of amount of EDA present that will result in asymmetric particles being formed. If a greater amount of EDA is present, symmetrical particles will be formed.Type: GrantFiled: June 12, 2018Date of Patent: April 16, 2024Assignee: THE UNIVERSITY OF QUEENSLANDInventors: Chengzhong (Michael) Yu, Jianye Fu, Jinqing Jiao, Yang Liu
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Publication number: 20230375558Abstract: The present disclosure provides methods for determining collagen content using collagen hybridizing peptides. The present disclosure provides methods for quantifying an amount of disrupted collagen (e.g., collagen with disrupted triple helicity) and/or total collagen. The present disclosure provides methods for quantifying an amount of disrupted collagen (e.g., collagen with disrupted triple helicity) as a portion of total collagen.Type: ApplicationFiled: September 21, 2021Publication date: November 23, 2023Applicant: 3Helix, Inc.Inventors: Yang Li, Lucas Bennink, Michael Kirkness, S. Michael Yu
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Publication number: 20230264046Abstract: Systems and methods for assessing patient-specific evolution of resistance to therapy and progression of disease in recurrent high-grade glioma patients are described herein. An example method includes receiving a plurality of patient-specific parameters for a patient having recurrent high-grade glioma. The patient-specific parameters include an evolution of resistance rate to a In combination therapy, a pre-treatment tumor volume, and a radiation surviving fraction. The method also includes simulating, for each of a plurality of radiation therapy protocols, a respective volumetric tumor growth trajectory for the patient. The simulation is performed using a tumor growth model based on the patient-specific parameters. The method further includes determining an optimal radiation therapy protocol based on the simulation, wherein the optimal radiation therapy prolongs progression of the recurrent high-grade glioma.Type: ApplicationFiled: June 18, 2021Publication date: August 24, 2023Inventors: Heiko ENDERLING, Solmaz SAHEBJAM, Daniel J. GLAZAR, Hsiang-Hsuan Michael YU
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Patent number: 11662516Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.Type: GrantFiled: April 27, 2022Date of Patent: May 30, 2023Assignee: Applied Materials, Inc.Inventors: Michael Yu-tak Young, Wayne McMillan, Rutger Meyer Timmerman Thijssen, Robert Jan Visser
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Patent number: 11604108Abstract: Various tactile sensors and associated methods are enabled. For instance, a sensing apparatus comprises a photosensitive sensor. A compound-eye structure is on the photosensitive sensor and an elastomer layer is on the compound-eye structure. A reflective layer is on the elastomer layer, opposite the compound-eye structure and a light source emits light between the reflective layer and the compound-eye structure.Type: GrantFiled: June 2, 2020Date of Patent: March 14, 2023Assignee: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGYInventors: Hongyu Yu, Michael Yu Wang, Xia Chen, Yazhan Zhang
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Patent number: 11429083Abstract: Modeling, constructing, and designing conformal cellular structures with spatially variable and graded microstructures that have full geometric continuity is disclosed, which includes defining a global structural domain, where the microstructures are generated for a global mesh, defining a unit structure as a base cell using a level set function, which allows for beams, trusses, shells, and solids, transforming and mapping the base cell into each element of the global mesh using an isoparametric transformation, which creates a conformal cellular structure in accordance with a set of requirements on distribution of material and/or mechanical properties, and applying a global cutting function to guarantee geometric continuity in connections on the common face of any two neighboring cells of the structure. As a result, more complex geometric shapes and features can be generated at the cell level, while maintaining the specified geometric connectivity across the cells of the structure.Type: GrantFiled: August 10, 2018Date of Patent: August 30, 2022Assignee: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGYInventors: Michael Yu Wang, Yiqiang Wang
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Publication number: 20220252780Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.Type: ApplicationFiled: April 27, 2022Publication date: August 11, 2022Inventors: Michael Yu-tak YOUNG, Wayne MCMILLAN, Rutger MEYER TIMMERMAN THIJSSEN, Robert Jan VISSER
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Patent number: 11327218Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.Type: GrantFiled: November 13, 2018Date of Patent: May 10, 2022Assignee: Applied Materials, Inc.Inventors: Michael Yu-tak Young, Wayne McMillan, Rutger Meyer Timmerman Thijssen, Robert Jan Visser
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Publication number: 20220082738Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a film stack disposed on a substrate without planarization. The method includes forming a hardmask on a top surface of a film stack. Forming a mask material on a portion of the top surface and a portion of the hardmask. Etching the top surface. Trimming the mask. Etching the top surface again. Trimming the mask a second time. Etching the top surface yet again and then stripping the mask material.Type: ApplicationFiled: November 24, 2021Publication date: March 17, 2022Inventors: Michael Yu-tak YOUNG, Ludovic GODET, Robert Jan VISSER, Naamah ARGAMAN, Christopher Dennis BENCHER, Wayne MCMILLAN
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Patent number: 11187836Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.Type: GrantFiled: March 5, 2019Date of Patent: November 30, 2021Assignee: Applied Materials, Inc.Inventors: Michael Yu-tak Young, Ludovic Godet, Robert Jan Visser, Naamah Argaman, Christopher Dennis Bencher, Wayne McMillan
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Publication number: 20210292177Abstract: A method for forming dendritic mesoporous nanoparticles comprising preparing a mixture containing one or more polymer precursors, a silica precursor, and a compound that reacts with silica and reacts with the polymer or oligomer formed from the one or more polymer precursors, and stirring the mixture whereby nanoparticles are formed, and subsequently treating the nanoparticles to form dendritic mesoporous silica nanoparticles or dendritic mesoporous carbon nanoparticles. The silica precursor may comprise tetraethyl orthosilicate (TEOS), the one or more polymer precursors may comprise 3-aminophenol and formaldehyde and the compound may be ethylene diamine (EDA). There is a window of amount of EDA present that will result in asymmetric particles being formed. If a greater amount of EDA is present, symmetrical particles will be formed.Type: ApplicationFiled: June 12, 2018Publication date: September 23, 2021Inventors: Chengzhong (Michael) YU, Jianye FU, Jinqing JIAO, Yang LIU
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Patent number: 11043437Abstract: Embodiments of the present disclosure generally relate to an optically transparent substrate, comprising a major surface having a peripheral edge region with an orientation feature formed therein, and a texture formed on the peripheral edge region, the texture having an opacity that is greater than an opacity of the major surface.Type: GrantFiled: January 7, 2019Date of Patent: June 22, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Michael Yu-tak Young, Ludovic Godet, Robert Jan Visser
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Patent number: 10984593Abstract: Techniques for designing and optimization of solid/cellular structures are described using a modeling process referred to as high-definition cellular level set in B-splines (HD-CLIBS). With this process, the entire design domain for the solid/cellular structure in question is subdivided into a set of connected volumetric cells in three dimensions. An implicit trivariate B-spline function is defined on each subdomain cell. With this parameterization scheme, constraints can be imposed on the relevant B-spline coefficients to naturally maintain geometric continuities at the connection faces between neighboring cells. The method offers several useful properties and powerful functionalities to build and modify a solid/cellular structure in the modeling process and to conduct topology optimization by directly adjusting the B-spline coefficients. The model construction can be carried out using a fast B-spline interpolation, and the topology optimization can involve a sequence of discrete B-spline convolutions.Type: GrantFiled: October 28, 2019Date of Patent: April 20, 2021Assignee: THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGYInventor: Michael Yu Wang
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Patent number: 10955606Abstract: Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ? using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle ? and a back angle ? relative to a second plane of the surface of the substrate less than about 45°.Type: GrantFiled: November 14, 2018Date of Patent: March 23, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Michael Yu-tak Young, Ludovic Godet, Robert Jan Visser, Wayne McMillan
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Patent number: 10913801Abstract: The present invention relates to antibodies that bind human programmed cell death 1 (PD-1), and may be useful for treating cancer alone and in combination with chemotherapy and other cancer therapeutics.Type: GrantFiled: January 23, 2017Date of Patent: February 9, 2021Assignee: INNOVENT BIOLOGICS (SUZHOU) CO., LTD.Inventors: Hemanta Baruah, Cheng Chen, Xiaolin Liu, Andy Tsun, De-Chao Michael Yu
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Publication number: 20200393313Abstract: Various tactile sensors and associated methods are enabled. For instance, a sensing apparatus comprises a photosensitive sensor. A compound-eye structure is on the photosensitive sensor and an elastomer layer is on the compound-eye structure. A reflective layer is on the elastomer layer, opposite the compound-eye structure and a light source emits light between the reflective layer and the compound-eye structure.Type: ApplicationFiled: June 2, 2020Publication date: December 17, 2020Inventors: Hongyu Yu, Michael Yu Wang, Xia Chen, Yazhan Zhang
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Publication number: 20200392005Abstract: The present invention relates to a process for producing a plurality of hollow inorganic nanoparticles, which process comprises: (a) contacting a first monomer and a second monomer in a solvent to produce a composition comprising the solvent and a plurality of polymer nanoparticles; (b) adding an inorganic compound precursor to the composition comprising the solvent and the plurality of polymer nanoparticles to produce a composition comprising the solvent and a plurality of inorganic compound-coated polymer nanoparticles; (c) adding an additional amount of the first and second monomers to the composition comprising the solvent and the plurality of inorganic compound-coated polymer nanoparticles to produce a composition comprising the solvent and a plurality of composite nanoparticles; and (d) heating the plurality of composite nanoparticles to produce the plurality of hollow inorganic nanoparticles, wherein in step (a) the first monomer and the second monomer are contacted in the solvent at a temperature of aType: ApplicationFiled: November 14, 2018Publication date: December 17, 2020Applicant: N4 Pharma UK LimitedInventors: Chengzhong (Michael) Yu, Hao Song, Graham Worrall, Lynn Donlon
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Publication number: 20200301062Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.Type: ApplicationFiled: November 13, 2018Publication date: September 24, 2020Inventors: Michael Yu-tak YOUNG, Wayne MCMILLAN, Rutger MEYER TIMMERMAN THIJSSEN, Robert Jan VISSER