Patents by Inventor Michael Zani
Michael Zani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8278027Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: GrantFiled: July 21, 2011Date of Patent: October 2, 2012Assignee: Nexgen Semi Holding, Inc.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Publication number: 20120028464Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: ApplicationFiled: July 21, 2011Publication date: February 2, 2012Applicant: NEXGEN SEMI HOLDING, INC.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Patent number: 7993813Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: GrantFiled: November 21, 2007Date of Patent: August 9, 2011Assignee: NexGen Semi Holding, Inc.Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Publication number: 20080160431Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.Type: ApplicationFiled: November 21, 2007Publication date: July 3, 2008Inventors: Jeffrey Scott, Michael Zani, Mark Bennahmias, Mark Mayse
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Publication number: 20070284537Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284527Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 17, 2007Publication date: December 13, 2007Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284695Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284538Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278428Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278419Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278418Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070045534Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: July 10, 2006Publication date: March 1, 2007Inventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott