Patents by Inventor Michal Fastow

Michal Fastow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-step high density plasma (HDP) process to obtain uniformly doped insulating film
    Patent number: 6852649
    Abstract: A method of forming an essentially uniform doped insulating layer is disclosed. Variations in a substrate temperature that may result in a dopant gradient within a doped insulating layer can be compensated for by varying a dopant supply rate in a deposition process. One particular embodiment discloses a method of forming a high density plasma phosphosilicate glass having a phosphorous concentration of 8% or greater by weight that varies by no more than about 1% by weight throughout.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: February 8, 2005
    Assignee: Cypress Semiconductor Corporation
    Inventors: Prashant B. Phatak, Frederick G. Eisenmann, III, Michal Fastow