Patents by Inventor Michal Kowalski

Michal Kowalski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10773234
    Abstract: A range of carbon materials can be produced using lignin in combination with synthetic phenolic resins or naturally occurring lingo-cellulosic materials. The lignin, which is essentially a naturally occurring phenolic resin, has a carbon yield on pyrolysis similar to that of the synthetic resins, which aids processing. The lignin can be used as a binder phase for synthetic resin or lignocellulosic materials allowing the production of monolithic carbons from a wide range of precursors, as the primary structural material where the thermal processing is modified by the addition of small quantities of synthetic resin materials or as structure modified in the production of meso/macro porous carbons in either bead, granular or monolithic form. A carbonised monolith is provided comprising mesoporous and/or macroporous carbon particles dispersed in a matrix of microporous carbon particles with voids between the particles defining paths for fluid to flow into and through the structure.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: September 15, 2020
    Assignee: Neoteryx, LLC
    Inventors: Stephen Robert Tennison, Michal Kowalski, Thomas Avery, Susan Rachel Sandeman, Carol Angela Howell, Yishan Zheng, Ganesh Ingavle, Sergey Victorovich Mikhalovsky, Mambet Nuraliyev
  • Publication number: 20200203614
    Abstract: The invention relates to novel organic semiconducting polymers, to methods for their preparation and educts or intermediates used therein, to compositions containing them, to the use of the polymers and compositions as organic semiconductors in, or for the preparation of, organic electronic (OE) devices, especially organic photovoltaic (OPV) devices, perovskite-based solar cell (PSC) devices, organic photodetectors (OPD), organic field effect transistors (OFET) and organic light emitting diodes (OLED), and to OE, OPV, PSC, OPD, OFET and OLED devices comprising these polymers or compositions.
    Type: Application
    Filed: August 10, 2018
    Publication date: June 25, 2020
    Applicant: MERCK PATENT GMBH
    Inventors: Sebastian KOWALSKI, Nicolas BLOUIN, Agnieszka PRON, Michal KROMPIEC
  • Publication number: 20190022623
    Abstract: A range of carbon materials can be produced using lignin in combination with synthetic phenolic resins or naturally occurring lingo-cellulosic materials. The lignin, which is essentially a naturally occurring phenolic resin, has a carbon yield on pyrolysis similar to that of the synthetic resins, which aids processing. The lignin can be used as a binder phase for synthetic resin or lignocellulosic materials allowing the production of monolithic carbons from a wide range of precursors, as the primary structural material where the thermal processing is modified by the addition of small quantities of synthetic resin materials or as structure modified in the production of meso/macro porous carbons in either bead, granular or monolithic form. A carbonised monolith is provided comprising mesoporous and/or macroporous carbon particles dispersed in a matrix of microporous carbon particles with voids between the particles defining paths for fluid to flow into and through the structure.
    Type: Application
    Filed: July 15, 2016
    Publication date: January 24, 2019
    Inventors: Stephen Robert Tennison, Michal Kowalski, Susan Rachel Sandeman, Carol Angela Howell, Yishan Zheng, Ganesh Ingavle, Sergey Victorovich Mikhalovsk, Mambet Nuraliyev
  • Patent number: 8532949
    Abstract: Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: September 10, 2013
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Cho Huak Teh, Tommaso Torelli, Dominic David, Chiuman Yeung, Michael Gordon Scott, Lalita A. Balasubramanian, Lisheng Gao, Tong Huang, Jianxin Zhang, Michal Kowalski, Jonathan Oakley
  • Patent number: 8111900
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Grant
    Filed: May 15, 2010
    Date of Patent: February 7, 2012
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
  • Patent number: 8000922
    Abstract: Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: August 16, 2011
    Assignee: KLA-Tencor Corp.
    Inventors: Hong Chen, Michael J. Van Riet, Chien-Huei (Adam) Chen, Jason Z. Lin, Chris Maher, Michal Kowalski, Barry Becker, Stephanie Chen, Subramanian Balakrishnan, Suryanarayana Tummala
  • Publication number: 20100226562
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Application
    Filed: May 15, 2010
    Publication date: September 9, 2010
    Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkami
  • Patent number: 7729529
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: June 1, 2010
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
  • Publication number: 20090299681
    Abstract: Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 3, 2009
    Inventors: Hong Chen, Michael J. Van Riet, Chien-Huei (Adam) Chen, Jason Z. Lin, Chris Maher, Michal Kowalski, Barry Becker, Stephanie Chen, Subramanian Balakrishnan, Suryanarayana Tummala
  • Publication number: 20060291714
    Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
    Type: Application
    Filed: December 7, 2004
    Publication date: December 28, 2006
    Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
  • Patent number: 7142992
    Abstract: Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface. The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: November 28, 2006
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Patrick Huet, Maruti Shanbhag, Sandeep Bhagwat, Michal Kowalski, Vivekanand Kini, David Randall, Sharon McCauley, Tong Huang, Jianxin Zhang, Kenong Wu, Lisheng Gao, Ariel Tribble, Ashok Kulkarni, Cecelia Anne Campochiaro
  • Publication number: 20060265145
    Abstract: Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.
    Type: Application
    Filed: September 30, 2004
    Publication date: November 23, 2006
    Inventors: Patrick Huet, Maruti Shanbhag, Sandeep Bhagwat, Michal Kowalski, Vivekanand Kini, David Randall, Sharon McCauley, Tong Huang, Jianxin Zhang, Kenong Wu, Lisheng Gao, Ariel Tribble, Ashok Kulkarni, Cecelia Anne Campochiaro
  • Publication number: 20060082763
    Abstract: Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.
    Type: Application
    Filed: October 12, 2005
    Publication date: April 20, 2006
    Inventors: Cho Teh, Tommaso Torelli, Dominic David, Chiuman Yeung, Michael Scott, Lalita Balasubramanian, Lisheng Gao, Tong Huang, Jianxin Zhang, Michal Kowalski, Jonathan Oakley