Patents by Inventor Michal Kowalski
Michal Kowalski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230348516Abstract: This invention is related to novel inhibitors of chitinase-like protein YKL-40 and their therapeutic applications. Such YKL-40 inhibitors are of use as therapeutic agents for the treatment a variety of diseases and disorders, including cancers, inflammation, and pulmonary diseases.Type: ApplicationFiled: April 28, 2023Publication date: November 2, 2023Inventors: Wojciech Czestkowski, Marzena Mazur, Przemyslaw Wanat, Gleb Andryianau, Piotr Niedziejko, Michal Kowalski, Mariusz Marek Gruza, Kamil Lisiecki, Piotr Pomaransk, Damian Kusmirek, Diana Papiernik, Katarzyna Drzewicka, Katarzyna Piwowar, Katarzyna Krysztofiak, Jacek Olczak, Adam Golebiowski, Lukasz Krzeminski, Agnieszka Bartoszewicz
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Publication number: 20230278996Abstract: Disclosed are novel assays for screening active compounds interfering with interaction between chitinase-like protein YKL-40 and chitin oligomers, as well as interfering with interaction between chitinase-like protein YKL-40 and heparan sulfate. Moreover, disclosed are novel active compounds identified by these assays as inhibitors of chitinase-like protein YKL-40, their therapeutic applications, and their use in biosensors measuring the level of chitinase-like protein YKL-40 in biological samples.Type: ApplicationFiled: March 3, 2023Publication date: September 7, 2023Inventors: Lukasz Krzeminski, Wojciech Czestkowski, Marzena Mazur, Gleb Andryianau, Sylwia Olejniczak, Michal Czeslaw Piotrowicz, Robert Koralewski, Elzbieta Pluta, Krzysztof Matyszewski, Michal Kowalski, Barbara Dymek, Rafal Koziel, Jacek Olczak, Adam Golebiowski, Agnieszka Bartoszewicz, Katarzyna Krysztofiak
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Patent number: 11638707Abstract: Disclosed are amino triazole compounds of formula (I). These compounds are inhibitors of acidic mammalian chitinase and chitotriosidase. Also disclosed are methods of using the compounds to treat asthma reactions caused by allergens, as well as acute and chronic inflammatory diseases, autoimmune diseases, dental diseases, neurologic diseases, metabolic diseases, liver diseases, polycystic ovary syndrome, endometriosis, and cancer.Type: GrantFiled: July 15, 2020Date of Patent: May 2, 2023Assignee: Molecure S.A.Inventors: Marzena Mazur, Gleb Andryianau, Lukasz Joachimiak, Wojciech Czestkowski, Michal Kowalski, Piotr Niedziejko, Sylwia Olejniczak, Krzysztof Matyszewski, Robert Koralewski, Jacek Olczak, Adam Golebiowski, Agnieszka Bartoszewicz
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Patent number: 10773234Abstract: A range of carbon materials can be produced using lignin in combination with synthetic phenolic resins or naturally occurring lingo-cellulosic materials. The lignin, which is essentially a naturally occurring phenolic resin, has a carbon yield on pyrolysis similar to that of the synthetic resins, which aids processing. The lignin can be used as a binder phase for synthetic resin or lignocellulosic materials allowing the production of monolithic carbons from a wide range of precursors, as the primary structural material where the thermal processing is modified by the addition of small quantities of synthetic resin materials or as structure modified in the production of meso/macro porous carbons in either bead, granular or monolithic form. A carbonised monolith is provided comprising mesoporous and/or macroporous carbon particles dispersed in a matrix of microporous carbon particles with voids between the particles defining paths for fluid to flow into and through the structure.Type: GrantFiled: July 15, 2016Date of Patent: September 15, 2020Assignee: Neoteryx, LLCInventors: Stephen Robert Tennison, Michal Kowalski, Thomas Avery, Susan Rachel Sandeman, Carol Angela Howell, Yishan Zheng, Ganesh Ingavle, Sergey Victorovich Mikhalovsky, Mambet Nuraliyev
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Publication number: 20190022623Abstract: A range of carbon materials can be produced using lignin in combination with synthetic phenolic resins or naturally occurring lingo-cellulosic materials. The lignin, which is essentially a naturally occurring phenolic resin, has a carbon yield on pyrolysis similar to that of the synthetic resins, which aids processing. The lignin can be used as a binder phase for synthetic resin or lignocellulosic materials allowing the production of monolithic carbons from a wide range of precursors, as the primary structural material where the thermal processing is modified by the addition of small quantities of synthetic resin materials or as structure modified in the production of meso/macro porous carbons in either bead, granular or monolithic form. A carbonised monolith is provided comprising mesoporous and/or macroporous carbon particles dispersed in a matrix of microporous carbon particles with voids between the particles defining paths for fluid to flow into and through the structure.Type: ApplicationFiled: July 15, 2016Publication date: January 24, 2019Inventors: Stephen Robert Tennison, Michal Kowalski, Susan Rachel Sandeman, Carol Angela Howell, Yishan Zheng, Ganesh Ingavle, Sergey Victorovich Mikhalovsk, Mambet Nuraliyev
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Patent number: 8532949Abstract: Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.Type: GrantFiled: October 12, 2005Date of Patent: September 10, 2013Assignee: KLA-Tencor Technologies Corp.Inventors: Cho Huak Teh, Tommaso Torelli, Dominic David, Chiuman Yeung, Michael Gordon Scott, Lalita A. Balasubramanian, Lisheng Gao, Tong Huang, Jianxin Zhang, Michal Kowalski, Jonathan Oakley
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Patent number: 8111900Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: GrantFiled: May 15, 2010Date of Patent: February 7, 2012Assignee: KLA-Tencor Technologies Corp.Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
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Patent number: 8000922Abstract: Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.Type: GrantFiled: May 29, 2008Date of Patent: August 16, 2011Assignee: KLA-Tencor Corp.Inventors: Hong Chen, Michael J. Van Riet, Chien-Huei (Adam) Chen, Jason Z. Lin, Chris Maher, Michal Kowalski, Barry Becker, Stephanie Chen, Subramanian Balakrishnan, Suryanarayana Tummala
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Publication number: 20100226562Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: ApplicationFiled: May 15, 2010Publication date: September 9, 2010Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkami
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Patent number: 7729529Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: GrantFiled: December 7, 2004Date of Patent: June 1, 2010Assignee: KLA-Tencor Technologies Corp.Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid B. Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
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Publication number: 20090299681Abstract: Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.Type: ApplicationFiled: May 29, 2008Publication date: December 3, 2009Inventors: Hong Chen, Michael J. Van Riet, Chien-Huei (Adam) Chen, Jason Z. Lin, Chris Maher, Michal Kowalski, Barry Becker, Stephanie Chen, Subramanian Balakrishnan, Suryanarayana Tummala
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Publication number: 20060291714Abstract: Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.Type: ApplicationFiled: December 7, 2004Publication date: December 28, 2006Inventors: Kenong Wu, David Randall, Kourosh Nafisi, Ramon Ynzunza, Ingrid Peterson, Ariel Tribble, Michal Kowalski, Lisheng Gao, Ashok Kulkarni
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Patent number: 7142992Abstract: Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface. The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.Type: GrantFiled: September 30, 2004Date of Patent: November 28, 2006Assignee: KLA-Tencor Technologies Corp.Inventors: Patrick Huet, Maruti Shanbhag, Sandeep Bhagwat, Michal Kowalski, Vivekanand Kini, David Randall, Sharon McCauley, Tong Huang, Jianxin Zhang, Kenong Wu, Lisheng Gao, Ariel Tribble, Ashok Kulkarni, Cecelia Anne Campochiaro
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Publication number: 20060265145Abstract: Hybrid methods for classifying defects in semiconductor manufacturing are provided. The methods include applying a flexible sequence of rules for defects to inspection data. The sequence of rules includes deterministic rules, statistical rules, hybrid rules, or some combination thereof. The rules included in the sequence may be selected by a user using a graphical interface The method also includes classifying the defects based on results of applying the sequence of rules to the inspection data.Type: ApplicationFiled: September 30, 2004Publication date: November 23, 2006Inventors: Patrick Huet, Maruti Shanbhag, Sandeep Bhagwat, Michal Kowalski, Vivekanand Kini, David Randall, Sharon McCauley, Tong Huang, Jianxin Zhang, Kenong Wu, Lisheng Gao, Ariel Tribble, Ashok Kulkarni, Cecelia Anne Campochiaro
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Publication number: 20060082763Abstract: Various computer-implemented methods for classifying defects on a specimen are provided. One method includes assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The method also includes displaying information about the defect groups to a user. In addition, the method includes allowing the user to assign a classification to each of the defect groups. Systems configured to classify defects on a specimen are also provided. One system includes program instructions executable on a processor for assigning individual defects detected on the specimen to defect groups based on one or more characteristics of the individual defects. The system also includes a user interface configured for displaying information about the defect groups to a user and allowing the user to assign a classification to each of the defect groups.Type: ApplicationFiled: October 12, 2005Publication date: April 20, 2006Inventors: Cho Teh, Tommaso Torelli, Dominic David, Chiuman Yeung, Michael Scott, Lalita Balasubramanian, Lisheng Gao, Tong Huang, Jianxin Zhang, Michal Kowalski, Jonathan Oakley