Patents by Inventor Michel Franciscus Van Rooy

Michel Franciscus Van Rooy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method and substrate
    Publication number: 20070216883
    Abstract: An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.
    Type: Application
    Filed: March 20, 2006
    Publication date: September 20, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Quaedackers, Koen Van Ingen Schenau, Patrick Wong, Michel Franciscus Van Rooy