Patents by Inventor Michel Fransois Hubert Klaassen
Michel Fransois Hubert Klaassen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8704199Abstract: A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).Type: GrantFiled: July 15, 2009Date of Patent: April 22, 2014Assignee: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Jan Bernard Plechelmus Van Schoot, Sylvain Dutartre
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Publication number: 20110188018Abstract: A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).Type: ApplicationFiled: July 15, 2009Publication date: August 4, 2011Applicant: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Jan Bernard Plechelmus Van Schoot, Sylvain Dutartre
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Patent number: 7952685Abstract: An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.Type: GrantFiled: March 15, 2007Date of Patent: May 31, 2011Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Hendrikus Robertus Marie Van Greevenbroek, Bernd Geh, Emil Peter Schmitt-Weaver
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Publication number: 20110122389Abstract: A lithographic apparatus includes a source module that include a collector and a radiation source. The collector is configured to collect radiation from the radiation source. An illuminator is configured to condition the radiation, collected by the collector and to provide a radiation beam. A detector is disposed in a fixed positional relationship with respect to the illuminator. The detector is configured to determine a position of the radiation source relative to the collector and a position of the source module relative to the illuminator.Type: ApplicationFiled: July 15, 2009Publication date: May 26, 2011Applicant: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Rogier Herman Mathijs Groeneveld, Alexander Matthijs Struycken, Gerardus Hubertus Petrus Maria Swinkels
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Patent number: 7872731Abstract: A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.Type: GrantFiled: April 20, 2007Date of Patent: January 18, 2011Assignee: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Hendrikus Robertus Marie Van Greevenbroek, Heine Melle Mulder, Erik Martijn Greijdanus
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Publication number: 20100182582Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: July 22, 2010Applicant: ASML Netherlands B.V,Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling
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Publication number: 20100118288Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: May 13, 2010Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling
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Publication number: 20100045956Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined.Type: ApplicationFiled: June 13, 2006Publication date: February 25, 2010Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Haico Victor Kok, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk, Wilhelmus Jacobus Maria Rooijakkers, Johannes Maria Kuiper, Leon Van Dooren, Jacob Sonneveld, Erwin Johannes Martinus Giling
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Patent number: 7538875Abstract: A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.Type: GrantFiled: December 17, 2004Date of Patent: May 26, 2009Assignee: ASML Netherlands B.V.Inventors: Remco Marcel Van Dijk, Donis George Flagello, Michel Fransois Hubert Klaassen, Tammo Uitterdijk
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Publication number: 20080259300Abstract: A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.Type: ApplicationFiled: April 20, 2007Publication date: October 23, 2008Applicant: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Hendrikus Robertus Marie Van Greevenbroek, Heine Melle Mulder, Erik Martijn Greijdanus
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Publication number: 20080225260Abstract: An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.Type: ApplicationFiled: March 15, 2007Publication date: September 18, 2008Applicants: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Michel Fransois Hubert Klaassen, Hendrikus Robertus Marie Van Greevenbroek, Bernd Geh, Emil Peter Schmitt-Weaver
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Patent number: 7375799Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support.Type: GrantFiled: February 25, 2005Date of Patent: May 20, 2008Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Wilhelmus Petrus De Boeij, Hendrikus Robertus Marie Van Greevenbroek, Michel Fransois Hubert Klaassen, Martijn Gerard Dominique Wehrens, Tammo Uitterdijk
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Patent number: 7352443Abstract: The present invention relates to a lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC). In particular, the present invention relates to a lithographic apparatus designed to be used with radiation having a wavelength in the Deep Ultra-Violet (DUV) and wherein radially polarized light is used to enhance the image contrast. In particular the present invention relates to partial clipping of the first order.Type: GrantFiled: November 4, 2005Date of Patent: April 1, 2008Assignee: ASML Netherlands B.V.Inventors: Laurentius Cornelius De Winter, Michel Fransois Hubert Klaassen
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Publication number: 20080062385Abstract: The invention relates to a method of monitoring a polarization performance of an optical system in a lithographic projection apparatus. The lithographic projection apparatus has an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and provided with a polarization sensitive feature. In the method, first the patterning device, a detector and a projection system are provided such that upon illumination of the polarization sensitive feature, an image of this feature is projected by the projection system on the detector. Then, an image intensity of the image is measured. Finally, a polarization-related parameter based on the image intensity as measured is determined.Type: ApplicationFiled: April 7, 2006Publication date: March 13, 2008Applicant: ASML NETHERLANDS B.V.Inventor: Michel Fransois Hubert Klaassen