Patents by Inventor Michel G. Tuszewski

Michel G. Tuszewski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6572935
    Abstract: A plasma-based method for the deposition of diamond-like carbon (DLC) coatings is described. The process uses a radio-frequency inductively coupled discharge to generate a plasma at relatively low gas pressures. The deposition process is environmentally friendly and scaleable to large areas, and components that have geometrically complicated surfaces can be processed. The method has been used to deposit adherent 100-400 nm thick DLC coatings on metals, glass, and polymers. These coatings are between three and four times harder than steel and are therefore scratch resistant, and transparent to visible light. Boron and silicon doping of the DLC coatings have produced coatings having improved optical properties and lower coating stress levels, but with slightly lower hardness.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: June 3, 2003
    Assignee: The Regents of the University of California
    Inventors: Xiao-Ming He, Deok-Hyung Lee, Michael A. Nastasi, Kevin C. Walter, Michel G. Tuszewski
  • Patent number: 6153852
    Abstract: A method for optimizing the efficiency of an inductively coupled plasma (ICP) torch by varying at least one of a plasma gas flow rate and a power level applied to energize the ICP torch, and method and apparatus for efficiently using a CO.sub.2 feed as both a reactant and for generating a thermal plasma to produce high value chemical feed stocks, such as a synthesis gas or carbon monoxide from low value feedstocks, such as methane or carbon.
    Type: Grant
    Filed: February 12, 1999
    Date of Patent: November 28, 2000
    Inventors: Andreas S. Blutke, Edward M. Bohn, Robert S. Ottinger, Michel G. Tuszewski, John S. Vavruska
  • Patent number: 5650618
    Abstract: A mass spectrometer and methods for mass spectrometry which are useful in characterizing a plasma. This mass spectrometer for determining type and quantity of ions present in a plasma is simple, compact, and inexpensive. It accomplishes mass analysis in a single step, rather than the usual two-step process comprised of ion extraction followed by mass filtering. Ions are captured by a measuring element placed in a plasma and accelerated by a known applied voltage. Captured ions are bent into near-circular orbits by a magnetic field such that they strike a collector, producing an electric current. Ion orbits vary with applied voltage and proton mass ratio of the ions, so that ion species may be identified. Current flow provides an indication of quantity of ions striking the collector.
    Type: Grant
    Filed: November 30, 1995
    Date of Patent: July 22, 1997
    Assignee: The Regents of the University of California
    Inventor: Michel G. Tuszewski