Patents by Inventor Michel Riepen

Michel Riepen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 10254663
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: April 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Van Meer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • Immersion lithographic apparatus
    Patent number: 10216095
    Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: February 26, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christianus Wilhelmus Johannes Berendsen, Anton Alexander Darhuber, Hubertus Mattheus Joseph Maria Wedershoven, Josephus Catharina Henricus Zeegers
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 10209624
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
    Type: Grant
    Filed: December 12, 2017
    Date of Patent: February 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista
  • Fluid handling structure, a lithographic apparatus and a device manufacturing method
    Patent number: 10133190
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.
    Type: Grant
    Filed: September 9, 2016
    Date of Patent: November 20, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180321594
    Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
    Type: Application
    Filed: July 13, 2018
    Publication date: November 8, 2018
    Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertud Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180292762
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: June 14, 2018
    Publication date: October 11, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf KEMPER, Nicolaas TEN KATE, Joost Jeroen OTTENS, Marcel BECKERS, Marco POLIZZI, Michel RIEPEN, Anthonie KUIJPER, Koen STEFFENS, Adrianes Johannes BAETEN, Anca Mihaela ANTONEVICI
  • Radiation source and method for lithography
    Patent number: 10095119
    Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.
    Type: Grant
    Filed: October 23, 2013
    Date of Patent: October 9, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Hendrikus Gijsbertus Schimmel, Michel Riepen, Reinier Theodorus Martinus Jilisen, Dennis De Graaf
  • Lithographic apparatus and device manufacturing method
    Patent number: 10025196
    Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
    Type: Grant
    Filed: March 27, 2017
    Date of Patent: July 17, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
  • Lithographic apparatus and a device manufacturing method
    Patent number: 10018921
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: July 10, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cornelius Maria Rops, Nicolaas Rudolf Kemper, Michel Riepen
  • Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
    Patent number: 10018925
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: July 10, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • Fluid handling structure, a lithographic apparatus and a device manufacturing method
    Patent number: 9971255
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: May 15, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180101102
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
    Type: Application
    Filed: December 12, 2017
    Publication date: April 12, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena CORTIE, Paulus Martinus Maria LIEBREGTS, Michel RIEPEN, Fabrizio EVANGELISTA
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 9846372
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: December 19, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Paulus Martinus Maria Liebregts, Michel Riepen, Fabrizio Evangelista
  • LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20170357161
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
    Type: Application
    Filed: August 28, 2017
    Publication date: December 14, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Cornelius Maria ROPS, Nicolaas Rudolf Kemper, Michel Riepen
  • Radiation Source and Lithographic Apparatus
    Publication number: 20170322499
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Application
    Filed: July 27, 2017
    Publication date: November 9, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Radiation source and lithographic apparatus
    Patent number: 9753383
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: September 5, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170248854
    Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
    Type: Application
    Filed: March 27, 2017
    Publication date: August 31, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Michel RIEPEN
  • Lithographic apparatus and a device manufacturing method
    Patent number: 9746782
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: August 29, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cornelius Maria Rops, Nicolaas Rudolf Kemper, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170242348
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: May 8, 2017
    Publication date: August 24, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel RIEPEN, Christiaan Alexander HOOGENDAM, Paulus Martinus Maria LIEBREGTS, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Daniël Jozef Maria DIRECKS, Paul Petrus Joannes BERKVENS, Eva MONDT, Gert-Jan Gerardus Johannes Thomas BRANDS, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Mathieus Anna Karel VAN LIEROP, Christophe DE METSENAERE, Marcio Alexandre Cano MIRANDA, Patrick Johannes Wilhelmus SPRUYTENBURG, Joris Johan Anne-Marie VERSTRAETE, Franciscus Johannes Joseph JANSSEN
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170212422
    Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
    Type: Application
    Filed: April 7, 2017
    Publication date: July 27, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Hans JANSEN, Martinus Hendrikus Antonius LEENDERS, Paulus Martinus Maria LIEBREGTS, Jeroen Johannes Sophia Maria MERTENS, Jan-Gerard Cornelis VAN DER TOORN, Michel RIEPEN