Abstract: A radiation sensor device is disclosed for use with a radiation source, capable of emitting radiation with photon energies larger than the work function of the target comprising a target plate to be impacted by the radiation to generate photo-electrons, the target plate being electrically isolated from a shielding electrode. The shielding electrode is arranged to collect energy-filtered photo-electrons from the target plate, using an electrostatic barrier for the filtering. The target plate is constructed of a carbon material. A current measurement device is operative to keep the target plate at a preset voltage difference with respect to the shielding electrode and measure a photo-electron deficit current as a result of radiation impact on the target plate.

Abstract: A radiation sensor device is disclosed for use with a radiation source, capable of emitting radiation with photon energies larger than the work function of the target comprising a target plate to be impacted by the radiation to generate photo-electrons, the target plate being electrically isolated from a shielding electrode. The shielding electrode is arranged to collect energy-filtered photo-electrons from the target plate, using an electrostatic barrier for the filtering. The target plate is constructed of a carbon material. A current measurement device is operative to keep the target plate at a preset voltage difference with respect to the shielding electrode and measure a photo-electron deficit current as a result of radiation impact on the target plate.

Abstract: A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.