Abstract: Method (1) of deposition of at least one layer of at least one precursor of Perovskite on at least one substrate (4), through use of at least one deposition chamber (2), wherein the deposition chamber (2) is operatively connected to at least one vacuum pump (3); houses at least one source (5, 5?), the at least one source (5, 5?) being configured to receive at least one precursor of said Perovskite and said at least one source (5, 5?) having at least one delivery mouth (51, 51?), to let one gas of the at least one precursor of said Perovskite, when obtained into source (5, 5?), pass directly from the at least one source (5, 5?) into the at least one deposition chamber (2); and the deposition chamber (2) houses at least one supporting device (6) for the substrate (4), the supporting device (6) being configured to support said substrate (4) between at least one working position, wherein that substrate (4) is aligned with the at least one delivery mouth (51, 51?) of the at least one source (5, 5?), at a preset de

Abstract: A machine for the deposition of material on a substrate by the cathodic sputtering technique is provided, of the type provided with a cathode assembly having a tubular support extending substantially along a first axis (A), and a plurality of magnetic elements constrained to the tubular support and spaced from one another along the first axis (A), and wherein each of the magnetic elements has at least one second axis (M) of magnetic orientation, linking the respective magnetic poles (N; S) and has an outer side jutting from the tubular support and an inner side constrained to the tubular support, wherein the second axis (M) linking the poles of each magnetic element is transverse to the first axis (A) of the tubular support and the polarity (S; N) of the outer sides of two consecutive magnetic elements along the first axis (A) on the tubular support is alternating.

Abstract: A machine for the deposition of material on a substrate by the cathodic sputtering technique is provided, of the type provided with a cathode assembly having a tubular support extending substantially along a first axis (A), and a plurality of magnetic elements constrained to the tubular support and spaced from one another along the first axis (A), and wherein each of the magnetic elements has at least one second axis (M) of magnetic orientation, linking the respective magnetic poles (N; S) and has an outer side jutting from the tubular support and an inner side constrained to the tubular support, wherein the second axis (M) linking the poles of each magnetic element is transverse to the first axis (A) of the tubular support and the polarity (S; N) of the outer sides of two consecutive magnetic elements along the first axis (A) on the tubular support is alternating.