Patents by Inventor Michele Mura

Michele Mura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum fired and brazed ion pump element
    Patent number: 9053917
    Abstract: A Vacuum Fired and Brazed (“VFB”) anode array element for use in an ion pump is described. The VFB anode array element includes a first VFB conduit anode element and second VFB conduit anode element, wherein the second VFB conduit anode element is adjacent the first VFB conduit anode element. The first VFB conduit anode element is vacuum brazed together with second VFB conduit anode element.
    Type: Grant
    Filed: March 29, 2013
    Date of Patent: June 9, 2015
    Assignee: Agilent Technologies, Inc.
    Inventors: Stefania Ivaldi, Cristian Maccarrone, Michele Mura, Pierino Fiorito
  • VACUUM PUMPING SYSTEM WITH A PLURALITY OF SPUTTER ION PUMPS
    Publication number: 20100034668
    Abstract: In a vacuum pumping system with a plurality of sputter ion pumps the considerable reduction in its overall axial size and weight is achieved by utilizing a plurality of axially superimposed sputter ion pumps and a common magnetic circuit, which comprises a pair of external magnets located at opposite axial ends of the pumping system, one or more intermediate magnets arranged alternated with the sputter ion pumps and a ferromagnetic yoke, internally enclosing the external magnets and the one or more intermediate magnets.
    Type: Application
    Filed: August 6, 2009
    Publication date: February 11, 2010
    Inventors: Gianfranco Cappuzzo, Cristian Macarrone, Michele Mura
  • Sputter ion pump having an improved magnet assembly
    Publication number: 20070280834
    Abstract: A sputter ion pump (1) has an improved magnet assembly comprising primary magnets (9a, 9b), disposed on opposite ends of the pump cells of an anode, and secondary magnets (11; 11?, 11?) disposed on one side only of the pump cells, whereby the assembly exhibits an asymmetrical configuration. The sputter ion pump with the improved magnet assembly allows for attaining high pumping speeds even at low pressures with reduced size, weight and manufacturing cost of the pump itself.
    Type: Application
    Filed: May 30, 2007
    Publication date: December 6, 2007
    Inventors: Luca Bonmassar, Michele Mura