Patents by Inventor Michelle Zimmerman

Michelle Zimmerman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay targets with isolated, critical-dimension features and apparatus to measure overlay
    Patent number: 7283237
    Abstract: An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: October 16, 2007
    Assignee: Tokyo Electron Limited
    Inventors: Abdurrahman Sezginer, Michelle Zimmerman
  • Overlay targets with isolated, critical-dimension features and apparatus to measure overlay
    Publication number: 20050286051
    Abstract: An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.
    Type: Application
    Filed: September 1, 2005
    Publication date: December 29, 2005
    Inventors: Abdurrahman Sezginer, Michelle Zimmerman
  • Overlay targets with isolated, critical-dimension features and apparatus to measure overplay
    Publication number: 20040004726
    Abstract: An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.
    Type: Application
    Filed: June 11, 2003
    Publication date: January 8, 2004
    Inventors: Abdurrahman Sezginer, Michelle Zimmerman