Patents by Inventor Michiel David Nijkerk

Michiel David Nijkerk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9383490
    Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: July 5, 2016
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Borgert Kruizinga, Huibert Visser, Michiel David Nijkerk
  • Patent number: 9304300
    Abstract: An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: April 5, 2016
    Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
    Inventors: Huibert Visser, Borgert Kruizinga, Michiel David Nijkerk
  • Publication number: 20140320852
    Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.
    Type: Application
    Filed: December 10, 2012
    Publication date: October 30, 2014
    Inventors: Borgert Kruizinga, Huibert Visser, Michiel David Nijkerk
  • Publication number: 20130293885
    Abstract: An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.
    Type: Application
    Filed: August 12, 2011
    Publication date: November 7, 2013
    Inventors: Huibert Visser, Borgert Kruizinva, Michiel David Nijkerk
  • Patent number: 8559108
    Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: October 15, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Borgert Kruizinga, Martijn Gerard Dominique Wehrens, Michiel David Nijkerk, Kornelis Frits Feenstra
  • Patent number: 8164077
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: April 24, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Muellender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, Hubert Adriaan van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
  • Publication number: 20100284064
    Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.
    Type: Application
    Filed: December 19, 2008
    Publication date: November 11, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Borgert Kruizinga, Martijn Gerard Dominique Wehrens, Michiel David Nijkerk, Kornelis Frits Feenstra
  • Patent number: 7732762
    Abstract: The invention relates to a method of inspecting a specimen surface. The method comprises the steps of generating a plurality of primary beams directed towards the specimen surface, focussing the plurality of primary beams onto respective loci on the specimen surface, collecting a plurality of secondary beams of charged particles originating from the specimen surface upon incidence of the primary beams, converting at least one of the collected secondary beams into an optical beam, and detecting the optical beam.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: June 8, 2010
    Assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek TNO
    Inventors: Michiel David Nijkerk, Pieter Kruit
  • Publication number: 20100067653
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Application
    Filed: November 24, 2009
    Publication date: March 18, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Marco Wedowski, Markus Weiss, Stephan Mûllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa, Nadyeh Shariloo
  • Patent number: 7646004
    Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
    Type: Grant
    Filed: May 24, 2006
    Date of Patent: January 12, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Müllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H. A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
  • Patent number: 7379153
    Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: May 27, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Gerardus Gijsbertsen, Pieter Willem Horman De Jager, Michiel David Nijkerk
  • Publication number: 20040013954
    Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
    Type: Application
    Filed: February 3, 2003
    Publication date: January 22, 2004
    Inventors: Johannes Gerardus Gijsbertsen, Pieter Willem Horman De Jager, Michiel David Nijkerk