Patents by Inventor Michiel Puyt

Michiel Puyt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, substrate table, and method for enhancing substrate release properties
    Patent number: 8792085
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
    Type: Grant
    Filed: August 13, 2010
    Date of Patent: July 29, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Michiel Puyt, Arno Jan Bleeker, Rene Theodorus Petrus Compen, Rudolf Hartmut Fischer
  • Lithographic Apparatus, Substrate Table, and Method for Enhancing Substrate Release Properties
    Publication number: 20100296073
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
    Type: Application
    Filed: August 13, 2010
    Publication date: November 25, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Michiel PUYT, Arno Jan Bleeker, Johannes Hendrikus Gertrudis Franssen, Rene Theodorus Petrus Compen, Johannes Theodorus Guillielmus Maria Van De Ven, Egbert Dirk Stam, Rudolf Hartmut Fischer, Edwin Robert Martin Gelinck
  • Lithographic apparatus, substrate table, and method for enhancing substrate release properties
    Patent number: 7791708
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
    Type: Grant
    Filed: December 27, 2006
    Date of Patent: September 7, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Michiel Puyt, Arno Jan Bleeker, Johannes Hendrikus Gertrudis Franssen, Rene Theodorus Petrus Compen, Johannes Theodorus Guillielmus Maria Van De Ven, Egbert Dirk Stam, Rudolf Hartmut Fischer, Edwin Robert Martin Gelinck
  • Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate
    Patent number: 7508494
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: March 24, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Johannes Hendrikus Gertrudis Franssen, Johannes Theodorus Guillielmus Maria Van De Ven, Michiel Puyt, Teun Peterus Adrianus De Wilt
  • Lithographic apparatus, substrate table, and method for enhancing substrate release properties
    Publication number: 20080158538
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.
    Type: Application
    Filed: December 27, 2006
    Publication date: July 3, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michiel Puyt, Arno Jan Bleeker, Johannes Hendrikus Gertrudis Franssen, Rene Theodorus Petrus Compen, Johannes Theodorus Guillielmus Maria Van De Ven, Egbert Dirk Stam, Rudolf Hartmut Fischer, Edwin Robert Martin Gelinck
  • Lithographic apparatus, a substrate table and a method for releasing a wafer
    Publication number: 20080151212
    Abstract: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.
    Type: Application
    Filed: December 22, 2006
    Publication date: June 26, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Johannes Hendrikus Gertrudis Franssen, Johannes Theodorus Guillielmus Maria Van De Ven, Michiel Puyt, Teun Peterus Adrianus De Wilt