Patents by Inventor Michiel van der Stam

Michiel van der Stam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8885973
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: November 11, 2014
    Assignee: FEI Company
    Inventors: Bernd Rieger, Michiel van der Stam
  • Publication number: 20130266240
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Application
    Filed: March 13, 2013
    Publication date: October 10, 2013
    Applicant: FEI Company
    Inventors: Bernd Rieger, Michiel van der Stam
  • Patent number: 8447133
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: May 21, 2013
    Assignee: FEI Company
    Inventors: Bernd Rieger, Michiel Van Der Stam
  • Publication number: 20100246993
    Abstract: The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
    Type: Application
    Filed: December 11, 2009
    Publication date: September 30, 2010
    Applicant: FEI COMPANY
    Inventors: Bernd Rieger, Michiel van der Stam