Patents by Inventor Michihiko Sato

Michihiko Sato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10854881
    Abstract: It is an object of the present invention to provide an electrode having superior charge-discharge capacity, even in the case of using an active material containing silicon.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: December 1, 2020
    Assignees: TOKYO UNIVERSITY OF SCIENCE FOUNDATION, FUJIFILM WAKO PURE CHEMICAL CORPORATION
    Inventors: Shinichi Komaba, Kiyofumi Yamagiwa, Shoko Aoki, Kuniaki Okamoto, Takahiro Kiyosu, Yasuyoshi Mori, Takatoshi Matsuura, Michihiko Sato
  • Publication number: 20170040612
    Abstract: It is an object of the present invention to provide an electrode having superior charge-discharge capacity, even in the case of using an active material containing silicon.
    Type: Application
    Filed: April 21, 2015
    Publication date: February 9, 2017
    Applicants: WAKO PURE CHEMICAL INDUSTRIES, LTD., TOKYO UNIVERSITY OF SCIENCE FOUNDATION
    Inventors: Shinichi Komaba, Kiyofumi Yamagiwa, Shoko Aoki, Kuniaki Okamoto, Takahiro Kiyosu, Yasuyoshi Mori, Takatoshi Matsuura, Michihiko Sato
  • Publication number: 20150056367
    Abstract: The present invention, which enables to align a liquid crystal molecule, when no voltage is applied thereto, and also to control pretilt angle of the liquid crystal molecule, relates to a composition for a liquid crystal alignment film comprising components represented by the following (A) to (D): (A) a meta-phenylene diamine derivative represented by the general formula [1]; (B) a meta-phenylene diamine derivative represented by the general formula [2]; (C) a para-arylene diamine represented by the general formula [3]; (D) a tetracarboxylic acid represented by the general formula [4] or a tetracarboxylic acid anhydride represented by the general formula [4?]; (wherein R1 represents an alkyl group having 1 to 6 carbon atoms or the like, R2 represents an alkyl group having 8 to 20 carbon atoms or the like, t moieties of Ra represent an alkyl group having 1 to 3 carbon atoms or the like, n represents an integer of 1 to 3, t represents an integer of 0 to 4, T represents an oxygen atom or the like, Y repre
    Type: Application
    Filed: March 13, 2013
    Publication date: February 26, 2015
    Inventors: Yoshihiro Hosaka, Michihiko Sato, Mo Wu
  • Publication number: 20140378645
    Abstract: A problem of the present invention is to provide a liquid crystal aligning agent which never deteriorates even in a method where UV is irradiated such as a liquid crystal dropping method or the like, and is capable of forming a liquid crystal alignment film having high UV resistance.
    Type: Application
    Filed: January 7, 2013
    Publication date: December 25, 2014
    Inventors: Atsushi Kozaki, Michihiko Sato
  • Patent number: 6346253
    Abstract: A photoreactive agent is provided for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: February 12, 2002
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Kazuchiyo Takaoka, Michihiko Sato, Yoichiro Azuma, Yasuhiro Aizawa
  • Publication number: 20020006425
    Abstract: The present invention provides a photoreactive agent for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate; a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate; and a photoreactive agent for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing fil
    Type: Application
    Filed: February 28, 1997
    Publication date: January 17, 2002
    Inventors: KAZUCHIYO TAKAOKA, MICHIHIKO SATO, YOICHIRO AZUMA, YASUHIRO AIZAWA
  • Patent number: 6225015
    Abstract: Oxytitanium phthalocyanine having a novel crystal form having excellent electrophotographic properties, such as a high charge potential, a high sensitivity and stable performances free from causing changes in various properties in repeated use, can be produced in the absence of a halogen substance, by carrying out the crystal transformation of amorphous oxytitanium phthalocyanine in a solvent comprising water and naphthalene.
    Type: Grant
    Filed: June 3, 1999
    Date of Patent: May 1, 2001
    Assignee: Mitsubishi Paper Mills Ltd.
    Inventors: Makoto Okaji, Michihiko Sato, Kazuyuki Suruga, Tamotsu Horiuchi