Patents by Inventor Michihiro Hattori

Michihiro Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5053229
    Abstract: Novel cosmetic compositions comprising a lipid derived from horny cells can enhance a moisture retention ability of the horny layer and are useful for remedy of dry skin. When the lipid is used in combination with surface active agents, the above effect is enhanced.The cosmetic compositions may take any preparations such as creams, milky lotions, beauty wash, rouges, foundations, hair tonics and the like.
    Type: Grant
    Filed: January 24, 1989
    Date of Patent: October 1, 1991
    Assignee: Kao Corporation
    Inventors: Michihiro Hattori, Shuichi Akazaki, Naonobu Yoshizuka, Genji Imokawa
  • Patent number: 4778823
    Abstract: An external medicament comprises a novel amide derivative represented by the following formula (I). ##STR1## The external medicament is applicable to both a pharmaceutical external medicament and a cosmetic composition, and it provides excellent improving and preventing effects for chapping of the skin.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: October 18, 1988
    Assignee: Kao Corporation
    Inventors: Akira Kawamata, Shinji Yano, Michihiro Hattori, Shuichi Akazaki, Genji Imokawa, Naotake Takaishi
  • Patent number: 4710373
    Abstract: A composition for application to the skin to protect the skin from the long wavelength ultraviolet ray comprises a dibenzoylmethane derivative of the following general formula ##STR1## in which X represents a hydrogen atom, a monovalent metal cation, an organic cation, a linear or branched alkyl group having from 1 to 24 carbon atoms, or a polyoxyalkylene oxide having 2 or 3 carbon atoms, Y and Z each independently represent a hydroxyl group, a linear or branched alkyl group having from 1 to 24 carbon atoms, or an alkoxy group having from 1 to 24 carbon atoms, or a polyoxyalkylene oxide group having from 2 to 3 carbon atoms, and m and n are independently an integer of from 0 to 3.The composition is adjustable so as to have an optimum HLB balance and has good compatibility with various cosmetic bases. Further, it does not irritate the skin, is difficult to be percutaneously absorbed and shows continued skin-protecting effects.
    Type: Grant
    Filed: March 12, 1985
    Date of Patent: December 1, 1987
    Assignee: Kao Corporation
    Inventors: Koichi Nakamura, Michihiro Hattori, Tadashi Tamura, Toru Tejima, Naotake Takaishi, Genji Imokawa, Hajime Hotta
  • Patent number: 4704473
    Abstract: 4-methoxy-2'-carboxydibenzoylmethane of the following general formula (I) ##STR1## is prepared by reacting p-methoxyacetophenone (III) with phthalic anhydride (II) in accordance with the following reaction equation. ##STR2##The compound (I) and its salts absorb both UV-A and UV-B, and exhibit prominent effects as a ultraviolet absorber for cosmetic formulations such as skin cosmetic formulations and hair cosmetic formulations.
    Type: Grant
    Filed: December 4, 1985
    Date of Patent: November 3, 1987
    Assignee: Kao Corporation
    Inventors: Koichi Nakamura, Kimihiko Hori, Michihiro Hattori, Toru Tejima, Genji Imokawa, Naotake Takaishi
  • Patent number: 4584190
    Abstract: A chalcone derivative of the formula (I): ##STR1## in which R.sub.1 represents hydrogen or a methyl group, and R.sub.2 represents a linear or branched aliphatic hydrocarbon group having from 2 to 24 carbon atoms.The derivative is effective in protecting the skin when made into ultraviolet absorbing agents including an anti-sunburn oil, since it has the maximum absorbing capacity at a wave length in the vicinity of 350 nm, does not irritate the skin and is highly compatible with a cosmetic base.
    Type: Grant
    Filed: November 9, 1984
    Date of Patent: April 22, 1986
    Assignee: Kao Corporation
    Inventors: Tohru Tejima, Koichi Nakamura, Michihiro Hattori, Shinichi Masuda, Genji Imokawa, Naotake Takaishi